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Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect
Ma, Huiqin4,5; Yang, Weiyi2; Gao, Shuang2; Lin, Zifeng1; Mo, Zheyang4,5; Li, Chao3; Shang, Jian Ku5; Li, Qi2
刊名ACS APPLIED MATERIALS & INTERFACES
2021-12-08
卷号13期号:48页码:57214-57229
关键词supercapacitors h-WO3 /Bi2WO6 heterojunctions photoinduced capacitance enhancements photocatalytic memory effect postillumination capacitance enhancement retainment
ISSN号1944-8244
DOI10.1021/acsami.1c17386
通讯作者Li, Qi(qiliuiuc@outlook.com)
英文摘要Recently, photoassisted charging has been demonstrated as a green and sustainable approach to successfully enhance the capacitance of supercapacitors with low cost and good efficiency. However, their light-induced capacitance enhancement is relatively low and is lost quickly when the illumination is off. In this work, a novel active material system is developed for supercapacitors with the photoassisted charging capability by the decoration of a small amount of Bi2WO6 nanoparticles on an h-WO3 submicron rod surface in situ, which forms a typical type II band alignment heterostructure with a close contact interface through the co-sharing of W atoms between h-WO3 submicron rods and Bi2WO6 nanoparticles. The photogenerated charge carrier separation and transfer are largely enhanced in the h-WO3 /Bi2WO6 submicron rod electrode, which subsequently allows more charge carriers to participate in its photoassisted charging process to largely enhance its capacitance improvement under simulated solar illumination than that of the h-WO3 submicron rod electrode. Furthermore, the h-WO3/Bi2WO6 submicron rod electrode could retain its photoinduced capacitance enhancement in the dark for an extended period of time from the photocatalytic memory effect. Thus, our work provides a solution to the two major drawbacks of reported supercapacitors with the light-induced capacitance enhancement property, and supercapacitors based on active materials with the photocatalytic memory effect could be utilized in various technical fields.
资助项目National Natural Science Foundation of China[51672283] ; National Natural Science Foundation of China[51602316] ; National Natural Science Foundation of China[51902271] ; Fundamental Research Funds for the Central Universities[2682021CX116] ; Fundamental Research Funds for the Central Universities[2682020CX07] ; Fundamental Research Funds for the Central Universities[2682020CX08] ; Sichuan Science and Technology Program[2020YJ0259] ; Sichuan Science and Technology Program[2020YJ0072] ; Sichuan Science and Technology Program[2021YFH0163]
WOS研究方向Science & Technology - Other Topics ; Materials Science
语种英语
出版者AMER CHEMICAL SOC
WOS记录号WOS:000752970600042
资助机构National Natural Science Foundation of China ; Fundamental Research Funds for the Central Universities ; Sichuan Science and Technology Program
内容类型期刊论文
源URL[http://ir.imr.ac.cn/handle/321006/173471]  
专题金属研究所_中国科学院金属研究所
通讯作者Li, Qi
作者单位1.Sichuan Univ, Coll Mat Sci & Engn, Chengdu 610041, Peoples R China
2.Southwest Jiaotong Univ, Sch Mat Sci & Engn, Key Lab Adv Technol Mat, Minist Educ, Chengdu 610031, Peoples R China
3.Shandong Univ Technol, Sch Mat Sci & Engn, Zibo 255000, Peoples R China
4.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
5.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China
推荐引用方式
GB/T 7714
Ma, Huiqin,Yang, Weiyi,Gao, Shuang,et al. Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect[J]. ACS APPLIED MATERIALS & INTERFACES,2021,13(48):57214-57229.
APA Ma, Huiqin.,Yang, Weiyi.,Gao, Shuang.,Lin, Zifeng.,Mo, Zheyang.,...&Li, Qi.(2021).Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect.ACS APPLIED MATERIALS & INTERFACES,13(48),57214-57229.
MLA Ma, Huiqin,et al."Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect".ACS APPLIED MATERIALS & INTERFACES 13.48(2021):57214-57229.
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