Formation mechanism of nanosecond-laser-induced microstructures on amorphous silicon film surfaces

doi:10.1364/OE.434313

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所

	Formation mechanism of nanosecond-laser-induced microstructures on amorphous silicon film surfaces
	Y. Ren and Z. Zhang
刊名	Optics Express
	2021
卷号	29 期号:21 页码:33804-33817
ISSN号	10944087
DOI	10.1364/OE.434313
英文摘要	Laser-induced microstructures have attracted significant research interest owing to their wide application potential for anti-reflective surfaces and optoelectronic devices. To elucidate the characteristics of laser-patterned microstructures, nanosecond-laser-induced micro-protrusions on amorphous silicon film surfaces were investigated via single-and multi-line irradiation experiments. For the former, the results reveal that the number of periodic micro-protrusions depends on the peak power intensity. In addition, the height and the base diameter of the micro-protrusions can be tailored by adjusting the peak power intensity and scanning distance of the laser, while increasing the peak power intensity also increases surface roughness. X-ray spectroscopy confirmed that the microstructures were mainly composed of silicon. The relationship between the formation mechanism and the size of the micro-protrusions is also discussed, with the results of this study providing valuable insights into the laser-induced microstructure formation. 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement.
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内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/65258]
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Y. Ren and Z. Zhang. Formation mechanism of nanosecond-laser-induced microstructures on amorphous silicon film surfaces[J]. Optics Express,2021,29(21):33804-33817.
APA	Y. Ren and Z. Zhang.(2021).Formation mechanism of nanosecond-laser-induced microstructures on amorphous silicon film surfaces.Optics Express,29(21),33804-33817.
MLA	Y. Ren and Z. Zhang."Formation mechanism of nanosecond-laser-induced microstructures on amorphous silicon film surfaces".Optics Express 29.21(2021):33804-33817.