Active control technology of a diffraction grating wavefront by scanning beam interference lithography

doi:10.1364/OE.437593

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所

	Active control technology of a diffraction grating wavefront by scanning beam interference lithography
	Z. Liu; H. Yang; Y. Li; S. Jiang; W. Wang; Y. Song and L. W
刊名	Optics Express
	2021
卷号	29 期号:23 页码:5
ISSN号	10944087
DOI	10.1364/OE.437593
英文摘要	To fabricate plain holographic gratings with high wavefront quality and to obtain the wavefront required in varied line-space grating, an active control technology of a diffraction grating wavefront by modulating the phase distribution of the scanning-beam interference lithography system was proposed. Sinusoidal wavefront control is simulated, and the controlled wavefront being almost the same as the target wavefront. A photoresist grating was fabricated whose surface is uniform and the wavefront is ideally sinusoidal. The theoretical analysis and experimental results confirmed that the wavefront of the diffraction grating can be actively controlled by modulating the phase distribution of the scanning-beam interference lithography system. 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement.
URL标识	查看原文
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/65025]
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Z. Liu,H. Yang,Y. Li,et al. Active control technology of a diffraction grating wavefront by scanning beam interference lithography[J]. Optics Express,2021,29(23):5.
APA	Z. Liu,H. Yang,Y. Li,S. Jiang,W. Wang,&Y. Song and L. W.(2021).Active control technology of a diffraction grating wavefront by scanning beam interference lithography.Optics Express,29(23),5.
MLA	Z. Liu,et al."Active control technology of a diffraction grating wavefront by scanning beam interference lithography".Optics Express 29.23(2021):5.