Enhancing thermal properties of few-layer boron nitride by high-k Al2O3 capping layer

doi:10.1016/j.jallcom.2019.05.115

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	Enhancing thermal properties of few-layer boron nitride by high-k Al2O3 capping layer
	Y.X.Chen; K.L.Li; Z.W.Li; S.Q.Hu; X.J.Sun; Z.M.Shi; X.K.Liu
刊名	Journal of Alloys and Compounds
	2019
卷号	797 页码:262-268
关键词	Boron nitride,Thermal conductivity,Raman spectroscopy,graphene,conductivity,deposition,nanosheets
ISSN号	0925-8388
DOI	10.1016/j.jallcom.2019.05.115
英文摘要	Atomically thin boron nitride (BN) film has attracted increasing attention among two-dimensional materials for the potential application in electronics devices. The thermal properties of few-layer BN nanosheets (similar to 2.27 nm) on SiO2/Si substrates have been investigated without and with high-k Al2O3 capping layer, using the temperature-dependent and polarized-laser power-dependent Raman spectroscopy measurements. Due to the effect of Al2O3 capping layer, Raman spectrum illustrates the blue-shift of frequency from 1364.9 cm(-1) to 1367.9 cm(-1), and the first order temperature coefficient for E-2g mode of BN layers increases from -0.02243 cm(-1)/K to -0.06544 cm(-1)/K. Furthermore, the room-temperature thermal conductivity of BN with Al2O3 capping layer is found to be 332.57 W/mK, which is much larger than that of BN without Al2O3 capping layer (-94.51 W/mK). The enhancement is attributed to the interface charges and compressive stress at the interface between BN and Al2O3 capping layer, which has been clarified by the first principle calculations. This work is aimed at expanding the applications of BN materials and improving the performances of BN-based devices in thermal properties. (C) 2019 Elsevier B.V. All rights reserved.
URL标识	查看原文
语种	英语
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/63439]
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Y.X.Chen,K.L.Li,Z.W.Li,et al. Enhancing thermal properties of few-layer boron nitride by high-k Al2O3 capping layer[J]. Journal of Alloys and Compounds,2019,797:262-268.
APA	Y.X.Chen.,K.L.Li.,Z.W.Li.,S.Q.Hu.,X.J.Sun.,...&X.K.Liu.(2019).Enhancing thermal properties of few-layer boron nitride by high-k Al2O3 capping layer.Journal of Alloys and Compounds,797,262-268.
MLA	Y.X.Chen,et al."Enhancing thermal properties of few-layer boron nitride by high-k Al2O3 capping layer".Journal of Alloys and Compounds 797(2019):262-268.