Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique

doi:10.1016/j.jnoncrysol.2021.121204

CORC > 金属研究所 > 中国科学院金属研究所

	Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique
	Liu, Housheng 1,2; Tariq, Naeem ul Haq 3; Han, Rifei 1,2; Liu, Hanhui 1,2; Cui, Xinyu 1; Tang, Mingqiang 1; Xiong, Tianying 1
刊名	JOURNAL OF NON-CRYSTALLINE SOLIDS
	2022
卷号	575 页码:8
关键词	Chemical vapor deposition Amorphous SiOC coating Amorphous carbon
ISSN号	0022-3093
DOI	10.1016/j.jnoncrysol.2021.121204
通讯作者	Tang, Mingqiang(mqtang@imr.ac.cn) ; Xiong, Tianying(tyxiong@imr.ac.cn)
英文摘要	In this study, a dense fully amorphous (hydrogen-free) silicon oxycarbide (SiOC) coating was successfully deposited by thermal organometallic chemical vapor deposition (thermal MOCVD) technique using mixtures of liquid hexamethyldisiloxane (HMDSO) and ethanol. The nature of chemical bonding, microstructure and mechanical properties of the prepared coating were studied using field emission scanning electron microscopy (FESEM), scanning transmission electron microscopy (STEM), 29Si magic-angle-spinning nuclear magnetic resonance (MAS NMR), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and nano indentation techniques. The results showed that the prepared silicon oxycarbide coating is fully amorphous and it is composed of SiO4 and SiO3C structural units. The hardness (11.0 GPa) and elastic modulus (96.0 GPa) of the prepared coating were comparable or even better than other SiOC ceramic materials prepared by traditional high temperature processing techniques.
WOS研究方向	Materials Science
语种	英语
出版者	ELSEVIER
WOS记录号	WOS:000709825200007
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/167100]
专题	金属研究所_中国科学院金属研究所
通讯作者	Tang, Mingqiang; Xiong, Tianying
作者单位	1.Chinese Acad Sci, Shi Changxu Innovat Ctr Adv Mat, Inst Met Res, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 3.Pakistan Inst Engn & Appl Sci, Dept Met & Mat Engn, Islamabad, Pakistan
推荐引用方式 GB/T 7714	Liu, Housheng,Tariq, Naeem ul Haq,Han, Rifei,et al. Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS,2022,575:8.
APA	Liu, Housheng.,Tariq, Naeem ul Haq.,Han, Rifei.,Liu, Hanhui.,Cui, Xinyu.,...&Xiong, Tianying.(2022).Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique.JOURNAL OF NON-CRYSTALLINE SOLIDS,575,8.
MLA	Liu, Housheng,et al."Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique".JOURNAL OF NON-CRYSTALLINE SOLIDS 575(2022):8.