Optimization of the epitaxial structure of low-loss 885nm high-power laser diodes
Wu, Shun-Hua1,2; Li, Te1; Wang, Dan1; Yu, Xue-Cheng1; Wang, Zhen-Fu1; Liu, Guo-Jun2
2021
会议日期2021-06-03
会议地点Shanghai, China
关键词885nm low loss asymmetric waveguide high power high power conversion efficiency
卷号11907
DOI10.1117/12.2602879
英文摘要Aiming at the epitaxial structure of the high-power 885nm laser diodes, the factors limiting the further increase of the output power and the power conversion efficiency were investigated. According to the analysis, the epitaxial structure of the laser diodes was optimized, and the influence of the waveguide layer thickness on the carrier absorption loss and the series resistance was theoretically simulated. The results showed that the asymmetric waveguide structure with the thickness ratio of the N-side and the P-side of 6:4 can reduce the carrier absorption loss to the greatest extent. Based on the simulation results, the 885nm laser bars with the optimized epitaxial structure were fabricated and tested under the ambient temperature of 25 in a quasi-continuous wave mode of 250μs and 200Hz. The slope efficiency reaches 1.26W/A, while the series resistance is only 1.2mω. The power of 277.6W is achieved at 250A injection current and the maximum power conversion efficiency exceeds 64%. © 2021 SPIE.
产权排序1
会议录Sixteenth National Conference on Laser Technology and Optoelectronics
会议录出版者SPIE
语种英语
ISSN号0277786X;1996756X
ISBN号9781510646636
内容类型会议论文
源URL[http://ir.opt.ac.cn/handle/181661/95611]  
专题西安光学精密机械研究所_瞬态光学技术国家重点实验室
作者单位1.State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Shannxi, Xi'an; 710119, China
2.State Key Laboratory of High Power Semiconductor Laser, Changchun University of Science and Technology, Jilin, Changchun; 130022, China;
推荐引用方式
GB/T 7714
Wu, Shun-Hua,Li, Te,Wang, Dan,et al. Optimization of the epitaxial structure of low-loss 885nm high-power laser diodes[C]. 见:. Shanghai, China. 2021-06-03.
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