Near-threshold photodetachment microscopy in the presence of a transverse magnetic field

doi:10.1103/PhysRevA.100.013418

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	Near-threshold photodetachment microscopy in the presence of a transverse magnetic field
	Titimbo, K.; Chen, X. J.; Du, M. L.
刊名	PHYSICAL REVIEW A
	2019
卷号	100 期号:1 页码:13418
关键词	SPHERICAL TENSOR GRADIENT CLOSED CLASSICAL ORBITS WAVE PHOTODETACHMENT QUANTUM SPECTRA ATOMS INTERFERENCE ELECTRONS PHOTOIONIZATION DETACHMENT IONIZATION
ISSN号	2469-9926
DOI	10.1103/PhysRevA.100.013418
英文摘要	Near-threshold photodetachment microscopy of mononegative ions is theoretically studied when a homogeneous transverse magnetic field B is superimposed to the static electric field E. The electron flux distribution is obtained using two different approaches: the quantum source theory with the energy-Green function evaluated by means of the stationary phase approximation and the closed-orbit theory. Here we describe the physical ideas while developing the theory in detail. Both theoretical methods yield consistent descriptions for all field intensities and angular momentum of the detached electrons we have investigated and also reproduce reported experimental results. From our calculations, we have found that the presence of the transverse magnetic field leads to a global displacement of the recorded electron flux distribution along the E x B direction. Furthermore, we found that the shape of the recorded interference pattern changes from circular to elliptical as the magnetic field increases. We have theoretically characterized and quantified those effects on the interference pattern due to the presence of the transverse magnetic field.
学科主题	Optics ; Physics
语种	英语
内容类型	期刊论文
源URL	[http://ir.itp.ac.cn/handle/311006/27032]
专题	理论物理研究所_理论物理所1978-2010年知识产出
作者单位	1.Chen, X. J. 2.Du, M. L.] Chinese Acad Sci, Inst Theoret Phys, Beijing 100190, Peoples R China 3.[Chen, X. J. 4.Du, M. L.] Univ Chinese Acad Sci, Sch Phys Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China 5.[Titimbo, K.
推荐引用方式 GB/T 7714	Titimbo, K.,Chen, X. J.,Du, M. L.. Near-threshold photodetachment microscopy in the presence of a transverse magnetic field[J]. PHYSICAL REVIEW A,2019,100(1):13418.
APA	Titimbo, K.,Chen, X. J.,&Du, M. L..(2019).Near-threshold photodetachment microscopy in the presence of a transverse magnetic field.PHYSICAL REVIEW A,100(1),13418.
MLA	Titimbo, K.,et al."Near-threshold photodetachment microscopy in the presence of a transverse magnetic field".PHYSICAL REVIEW A 100.1(2019):13418.