Scanning tunneling microscopy observation to formation procedure of nano-Ti film

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	Scanning tunneling microscopy observation to formation procedure of nano-Ti film
	Xie, TS; Du, H; Meng, XM; Sun, C; Wen, LS
刊名	ACTA METALLURGICA SINICA
	2001-02-18
卷号	37 期号:2 页码:113-117
关键词	magnetron sputtering nano-Ti film scanning tunneling microscopy (STM)
ISSN号	0412-1961
通讯作者	Xie, TS(tsxie@imr.ac.cn)
英文摘要	Nano-Ti films with different thicknesses were deposited on polymer film substrate by magnetron sputtering. Scanning tunneling microscopy (STM) was used to study the structural characteristic. The results show that the film formed at the initial stage is composed of nuclei particles with diameter less than 2 nn and some particle accumulations. With increasing the sputtering time the deposited particles become island-like and then form Ti film consisted of nano particles. The average grain size increases with increasing thickness of film. The influences of substrate and magnetron sputtering conditions on the film structure were discussed.
WOS研究方向	Metallurgy & Metallurgical Engineering
语种	英语
出版者	SCIENCE CHINA PRESS
WOS记录号	WOS:000172766300001
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/113425]
专题	金属研究所_中国科学院金属研究所
通讯作者	Xie, TS
作者单位	Chinese Acad Sci, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Xie, TS,Du, H,Meng, XM,et al. Scanning tunneling microscopy observation to formation procedure of nano-Ti film[J]. ACTA METALLURGICA SINICA,2001,37(2):113-117.
APA	Xie, TS,Du, H,Meng, XM,Sun, C,&Wen, LS.(2001).Scanning tunneling microscopy observation to formation procedure of nano-Ti film.ACTA METALLURGICA SINICA,37(2),113-117.
MLA	Xie, TS,et al."Scanning tunneling microscopy observation to formation procedure of nano-Ti film".ACTA METALLURGICA SINICA 37.2(2001):113-117.