Scanning tunneling microscopy observation to formation procedure of nano-Ti film | |
Xie, TS; Du, H; Meng, XM; Sun, C; Wen, LS | |
刊名 | ACTA METALLURGICA SINICA
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2001-02-18 | |
卷号 | 37期号:2页码:113-117 |
关键词 | magnetron sputtering nano-Ti film scanning tunneling microscopy (STM) |
ISSN号 | 0412-1961 |
通讯作者 | Xie, TS(tsxie@imr.ac.cn) |
英文摘要 | Nano-Ti films with different thicknesses were deposited on polymer film substrate by magnetron sputtering. Scanning tunneling microscopy (STM) was used to study the structural characteristic. The results show that the film formed at the initial stage is composed of nuclei particles with diameter less than 2 nn and some particle accumulations. With increasing the sputtering time the deposited particles become island-like and then form Ti film consisted of nano particles. The average grain size increases with increasing thickness of film. The influences of substrate and magnetron sputtering conditions on the film structure were discussed. |
WOS研究方向 | Metallurgy & Metallurgical Engineering |
语种 | 英语 |
出版者 | SCIENCE CHINA PRESS |
WOS记录号 | WOS:000172766300001 |
内容类型 | 期刊论文 |
源URL | [http://ir.imr.ac.cn/handle/321006/113425] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
通讯作者 | Xie, TS |
作者单位 | Chinese Acad Sci, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110016, Peoples R China |
推荐引用方式 GB/T 7714 | Xie, TS,Du, H,Meng, XM,et al. Scanning tunneling microscopy observation to formation procedure of nano-Ti film[J]. ACTA METALLURGICA SINICA,2001,37(2):113-117. |
APA | Xie, TS,Du, H,Meng, XM,Sun, C,&Wen, LS.(2001).Scanning tunneling microscopy observation to formation procedure of nano-Ti film.ACTA METALLURGICA SINICA,37(2),113-117. |
MLA | Xie, TS,et al."Scanning tunneling microscopy observation to formation procedure of nano-Ti film".ACTA METALLURGICA SINICA 37.2(2001):113-117. |
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