Electrochemical characteristics of La-Ni-Al thin films

doi:10.1016/j.jallcom.2007.02.058

CORC > 金属研究所 > 中国科学院金属研究所

	Electrochemical characteristics of La-Ni-Al thin films
	Li, Chi Ying Vanessa 2; Wang, Zhong Min 3; Liu, Shi 1; Chan, Sammy Lap Ip 2
刊名	JOURNAL OF ALLOYS AND COMPOUNDS
	2008-05-29
卷号	456 期号:1-2 页码:407-412
关键词	thin films magnetron sputtering hydrogen storage electrochemical properties discharge capacity
ISSN号	0925-8388
DOI	10.1016/j.jallcom.2007.02.058
通讯作者	Chan, Sammy Lap Ip(sli.chan@unsw.edu.au)
英文摘要	AB(5) based hydrogen storage thin films (LaNi4.25Al0.75), deposited on Cu substrate by dc magnetron sputtering, have been investigated in this paper. X-ray diffraction (XRD) revealed that the microstructure of the film was in crystal form. SEM, AFM and FIB analyses proved that on the surface there were many pores of approximately 15-40 nm in diameter of random size. The cross section of the film revealed that it was rather dense and defect-free, with a uniform thickness of about 4.2 mu m. Electrochemical properties of the films were measured by simulated battery tests. The single layer LaNi4.25Al0.75 film undergoes a longer activation period than typical AB5 alloys in bulk and the maximum discharge capacity of the film was about 220 mAh/g. Two electrochemical behaviour (distinct to the bulk materials) were observed for the film electrode in which there was an apparent increase in intermediate potential for each discharge process, as well as a local increase of discharge potential during its activation period. (c) 2007 Elsevier B.V. All rights reserved.
WOS研究方向	Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000255510900070
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/95337]
专题	金属研究所_中国科学院金属研究所
通讯作者	Chan, Sammy Lap Ip
作者单位	1.Chinese Acad Sci, Inst Met Res, Beijing 100864, Peoples R China 2.Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, Australia 3.Guilin Univ Elect Technol, Ctr Mat Sci & Engn, Guilin 541004, Guangxi, Peoples R China
推荐引用方式 GB/T 7714	Li, Chi Ying Vanessa,Wang, Zhong Min,Liu, Shi,et al. Electrochemical characteristics of La-Ni-Al thin films[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2008,456(1-2):407-412.
APA	Li, Chi Ying Vanessa,Wang, Zhong Min,Liu, Shi,&Chan, Sammy Lap Ip.(2008).Electrochemical characteristics of La-Ni-Al thin films.JOURNAL OF ALLOYS AND COMPOUNDS,456(1-2),407-412.
MLA	Li, Chi Ying Vanessa,et al."Electrochemical characteristics of La-Ni-Al thin films".JOURNAL OF ALLOYS AND COMPOUNDS 456.1-2(2008):407-412.