Transparent conductive ZnO : Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering

doi:10.1016/j.tsf.2005.09.010

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	Transparent conductive ZnO : Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering
	Pei, ZL; Zhang, XB; Zhang, GP; Gong, J; Sun, C; Huang, RF; Wen, LS
刊名	THIN SOLID FILMS
	2006-02-21
卷号	497 期号:1-2 页码:20-23
关键词	zinc oxide TCO buffer layer sputtering
ISSN号	0040-6090
DOI	10.1016/j.tsf.2005.09.010
通讯作者	Wen, LS()
英文摘要	In this paper, we report different methods to reduce the sheet resistance of ZnO:Al (AZO) films on flexible substrates without degrading the optical transmittance in the visible range. Under proper bias, AZO films deposited on Al2O3-buffered flexible substrates showed a significant decrease of sheet resistance when compared with those deposited on bare polymer. The films with resistivity as low as 8.4 x 10(-4) ohm cm and the optical transmittance about 80% have been obtained by improved methods. By calculating the Al doping efficiency and the mean free path of electrons, ionized impurity scattering was considered to be the dominant factor for the transport mechanism of carriers. (c) 2005 Elsevier B.V. All rights reserved.
WOS研究方向	Materials Science ; Physics
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000234957300004
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/87072]
专题	金属研究所_中国科学院金属研究所
通讯作者	Wen, LS
作者单位	Chinese Acad Sci, Met Res Inst, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Pei, ZL,Zhang, XB,Zhang, GP,et al. Transparent conductive ZnO : Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering[J]. THIN SOLID FILMS,2006,497(1-2):20-23.
APA	Pei, ZL.,Zhang, XB.,Zhang, GP.,Gong, J.,Sun, C.,...&Wen, LS.(2006).Transparent conductive ZnO : Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering.THIN SOLID FILMS,497(1-2),20-23.
MLA	Pei, ZL,et al."Transparent conductive ZnO : Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering".THIN SOLID FILMS 497.1-2(2006):20-23.