Correction algorithm of edge effects in inductively coupled plasma processing | |
Zhang, Shiyang1,3; Fan, Bin1,3; Wang, Yongjian1,3; Xin, Qiang1,3; Wu, Jie2 | |
刊名 | Optik |
2020-12-01 | |
卷号 | 223 |
ISSN号 | 0030-4026 |
DOI | 10.1016/j.ijleo.2020.165565 |
文献子类 | 期刊论文 |
英文摘要 | Atmospheric plasma processing is a new type of non-contact processing method. And it mainly aimed at the processing of optical components or freeform mirrors without surface damage. The edge effect in plasma processing will cause the removal function to be unstable, and the convergence efficiency will be reduced. Therefore, it is necessary to improve the stability of the removal function and reduce the edge effect. Therefore, in this paper, it will focus on the edge effect problem in plasma processing, analyze the cause of the edge effect, and propose solutions for the edge effect. And, it is found that the edge effect is caused by the removal function. The area which is influenced by the edge effect will be reduced when the size of the removal function is reduced. Moreover, it is found the relationship between the removal function and radial position. Finally, the processing error will be reduced from 20 % to 10 % with the correction algorithm, which is aimed at the dwell time algorithm. © 2020 Elsevier GmbH |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.ioe.ac.cn/handle/181551/10122] |
专题 | 光电技术研究所_先光中心 |
作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China; 2.School of Mechanical Engineering, Sichuan University, Chengdu; 610065, China 3.University of Chinese Academy of Sciences, Beijing; 100049, China; |
推荐引用方式 GB/T 7714 | Zhang, Shiyang,Fan, Bin,Wang, Yongjian,et al. Correction algorithm of edge effects in inductively coupled plasma processing[J]. Optik,2020,223. |
APA | Zhang, Shiyang,Fan, Bin,Wang, Yongjian,Xin, Qiang,&Wu, Jie.(2020).Correction algorithm of edge effects in inductively coupled plasma processing.Optik,223. |
MLA | Zhang, Shiyang,et al."Correction algorithm of edge effects in inductively coupled plasma processing".Optik 223(2020). |
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