Metallic nanomesh for high-performance transparent electromagnetic shielding

doi:10.1364/OME.386830

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Metallic nanomesh for high-performance transparent electromagnetic shielding
	Liang, Zhuocheng 1,2; Zhao, Zeyu 1,2; Pu, Mingbo 1,2; Luo, Jun 1; Xie, Xin 1,2; Wang, Yanqing 1,2; Guo, Yinghui 1,2; Ma, Xiaoliang 1,2; Luo, Xiangang 1,2
刊名	Optical Materials Express
	2020-03-01
卷号	10 期号:3 页码:796-806
ISSN号	2159-3930
DOI	10.1364/OME.386830
文献子类	期刊论文
英文摘要	This paper reports a high-performance transparent electromagnetic shielding material based on an ultrathin and large-area metallic nanomesh, which was fabricated by a facile and rational process utilizing ultraviolet lithography and the ion beam etching technique. Measurements reveal that a single-layer metallic nanomesh can harvest excellent shielding effectiveness exceeding 40 dB in the wide frequency range from 500 MHz to 40 GHz. Besides, efficient light transmittance (85% at 550 nm) is achieved in both visible and near-infrared regions. Furthermore, the proposed structure remains excellent performance at wide incident angles even up to 50°. Hence, it is believed that this metallic nanomesh with easy fabrication can be a potential alternative in the transparent electromagnetic shielding domain. © 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
出版地	WASHINGTON
WOS关键词	MESH ; FILM ; EFFICIENT ; ULTRATHIN ; PATTERN
WOS研究方向	Materials Science ; Optics
语种	英语
出版者	OPTICAL SOC AMER
WOS记录号	WOS:000523216900012
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/10100]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China; 2.University of Chinese Academy of Sciences, Beijing; 100049, China
推荐引用方式 GB/T 7714	Liang, Zhuocheng,Zhao, Zeyu,Pu, Mingbo,et al. Metallic nanomesh for high-performance transparent electromagnetic shielding[J]. Optical Materials Express,2020,10(3):796-806.
APA	Liang, Zhuocheng.,Zhao, Zeyu.,Pu, Mingbo.,Luo, Jun.,Xie, Xin.,...&Luo, Xiangang.(2020).Metallic nanomesh for high-performance transparent electromagnetic shielding.Optical Materials Express,10(3),796-806.
MLA	Liang, Zhuocheng,et al."Metallic nanomesh for high-performance transparent electromagnetic shielding".Optical Materials Express 10.3(2020):796-806.