Fast structured illumination microscopy with reflectance disturbance resistibility and improved accuracy

doi:10.1364/OE.27.021508

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Fast structured illumination microscopy with reflectance disturbance resistibility and improved accuracy
	Xie, Zhongye 1,2; Tang, Yan 1; He, Yu 1; Liu, Junbo 1; Feng, Jinhua 1; Hu, Song 1
刊名	Optics Express
	2019-07-22
卷号	27 期号:15 页码:21508-21519
ISSN号	1094-4087
DOI	10.1364/OE.27.021508
文献子类	期刊论文
英文摘要	The conventional fast structured illumination microscopy (FSIM) without vertical scanning has been proposed by Lee for fast surface profiling. Nevertheless, this method is vulnerable to nonuniform surface reflectivity which is generally caused by the different reflection characteristic of hybrid materials and the environmental fluctuations. Consequently, traditional IFSIM cannot be used in the profile measurement for the samples with surface heterogeneity. In this paper, an improved FSIM configuration (IFSIM) is explored for improving the axial accuracy and suppressing the disturbance of the reflectivity. With this technique, a sinusoidal pattern produced by the digital micro-mirror device (DMD) is illuminated onto the sample. The reflected patterns are captured by two charge-coupled devices (CCDs) that are separately placed in and behind or before the focal plane. The subtraction and sum values of the two axial modulation response curves (AMRs) are divided as the new response function, which effectively suppresses the influence of the inhomogeneous reflectivity. Both wide dynamic range and enhanced axial accuracy can be selectively obtained by controlling the defocusing amount of the two differential detectors. The theoretical analysis and experiments are conducted to verify the feasibility of this method. © 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
WOS关键词	PROFILOMETRY ; SURFACE
WOS研究方向	Optics
语种	英语
出版者	OSA - The Optical Society
WOS记录号	WOS:000476652500118
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9769]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.State Key Laboratory of Optical Technologies for Micro-fabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan; 610209, China; 2.University of Chinese Academy of Sciences, Beijing; 100049, China
推荐引用方式 GB/T 7714	Xie, Zhongye,Tang, Yan,He, Yu,et al. Fast structured illumination microscopy with reflectance disturbance resistibility and improved accuracy[J]. Optics Express,2019,27(15):21508-21519.
APA	Xie, Zhongye,Tang, Yan,He, Yu,Liu, Junbo,Feng, Jinhua,&Hu, Song.(2019).Fast structured illumination microscopy with reflectance disturbance resistibility and improved accuracy.Optics Express,27(15),21508-21519.
MLA	Xie, Zhongye,et al."Fast structured illumination microscopy with reflectance disturbance resistibility and improved accuracy".Optics Express 27.15(2019):21508-21519.