Titanium Nitride Electron-Conductive Contact for Silicon Solar Cells By Radio Frequency Sputtering from a TiN Target

doi:10.1021/acsami.0c04439

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	Titanium Nitride Electron-Conductive Contact for Silicon Solar Cells By Radio Frequency Sputtering from a TiN Target
	Yu, Jing ; Phang, Pheng ; Samundsett, Christian ; Basnet, Rabin ; Neupan, Guru P.; Yang, Xi ; Macdonald, Daniel H.; Wan, Yimao ; Yan, Di ; Ye, Jichun
刊名	ACS APPLIED MATERIALS & INTERFACES
	2020
卷号	12 期号:23 页码:26177-26183
关键词	SELECTIVE CONTACTS THIN-FILMS THERMAL-STABILITY DOPED ZNO PERFORMANCE EFFICIENT TRANSPARENT LAYER HOLE
DOI	10.1021/acsami.0c04439
英文摘要	Efficient and stable electron selective materials compatible with commercial production are essential to the fabrication of dopant-free silicon solar cells. In this work, we report an air-stable TiN (titanium nitride) polycrystalline film, deposited using radio frequency sputtering process, as an electron selective contact in silicon solar cells. TiN films deposited at 300 W and 1.5 mTorr exhibit a low contact resistivity of 2.0 m Omega.cm(2). Furthermore, the main factors and mechanisms affecting the carrier selectivity properties are also explored. TiN layers as full area rear electron contacts in n-type silicon solar cells have been successfully implemented, even though TiN film contains some oxygen. This process yields a 17% increment in relative efficiency in comparison with reference devices (n-Si/Al contact). Hence, considering the low thermal budget, scalable technique, and low contact resistivity, the TiN layers can pave the way to fabricate high-efficiency selective contact silicon solar cells with a higher degree of reproducibility.
学科主题	Science & Technology - Other Topics ; Materials Science
内容类型	期刊论文
源URL	[http://ir.nimte.ac.cn/handle/174433/20736]
专题	2020专题
作者单位	1.Wan, YM 2.Yan, D (corresponding author), Australian Natl Univ, Res Sch Elect Energy & Mat Engn, Canberra, ACT 2601, Australia. 3.Ye, JC (corresponding author), Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Peoples R China.
推荐引用方式 GB/T 7714	Yu, Jing,Phang, Pheng,Samundsett, Christian,et al. Titanium Nitride Electron-Conductive Contact for Silicon Solar Cells By Radio Frequency Sputtering from a TiN Target[J]. ACS APPLIED MATERIALS & INTERFACES,2020,12(23):26177-26183.
APA	Yu, Jing.,Phang, Pheng.,Samundsett, Christian.,Basnet, Rabin.,Neupan, Guru P..,...&Ye, Jichun.(2020).Titanium Nitride Electron-Conductive Contact for Silicon Solar Cells By Radio Frequency Sputtering from a TiN Target.ACS APPLIED MATERIALS & INTERFACES,12(23),26177-26183.
MLA	Yu, Jing,et al."Titanium Nitride Electron-Conductive Contact for Silicon Solar Cells By Radio Frequency Sputtering from a TiN Target".ACS APPLIED MATERIALS & INTERFACES 12.23(2020):26177-26183.