Effects of secondary electron emission yield properties on gain and timing performance of ALD-coated MCP
Guo, Lehui2,3,4; Xin, Liwei2,4; Li, Lili2,3,4; Gou, Yongsheng4; Sai, Xiaofeng4; Li, Shaohui4; Liu, Hulin4; Xu, Xiangyan4; Liu, Baiyu4; Gao, Guilong4
刊名Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
2021-07-21
卷号1005
关键词Microchannel plate (MCP) Secondary electron emission (SEE) yield Gain Timing performance
ISSN号01689002
DOI10.1016/j.nima.2021.165369
产权排序1
英文摘要

The technology of atomic layer deposition has been used to improve the lifetime of the microchannel plate-photomultiplier tube (MCP-PMT) effectively and makes MCP possible to choose to coat different potential emissive materials on the internal surface of the MCP channels in the future. However, it is still an open question to what extent the secondary electron emission (SEE) yield properties of the emissive materials influence the behavior of the ALD-coated MCP. In this work, the dependences of the gain and timing performance on the SEE yield properties were assessed by using the Monte Carlo and particle-in-cell methods. We established the three-dimensional MCP single channel model in Computer Simulation Technology (CST) Particle Studio. Three important secondary electron emissions, the backscattered, rediffused and true SEEs, were discussed numerically based on the probabilistic model. The secondary electron cascade processes in the MCP single channel were simulated. The simulation results indicate that the opportunities for improving the gain of the ALD-coated MCP by improving the SEE yields corresponding to the incident energies of 0 eV–100 eV. The backscattered and rediffused electrons are found to have strong effects on the gain and timing performance of the MCP. Although the higher the SEE yield the higher the MCP gain, the drawback is the extremely high SEE yield will make the MCP saturated prematurely and degrade the time resolution. The simulation results will be used to guide the design and selection of emissive material for ALD-coated MCP development. © 2021 Elsevier B.V.

语种英语
出版者Elsevier B.V.
内容类型期刊论文
源URL[http://ir.opt.ac.cn/handle/181661/94738]  
专题条纹相机工程中心
通讯作者Chen, Ping
作者单位1.Key Laboratory for Laser Plasmas (Ministry of Education) and School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai; 200240, China
2.Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan; 030006, China;
3.University of Chinese Academy of Sciences, Beijing; 100049, China;
4.Key Laboratory of Ultra-fast photoelectric Diagnostics Technology, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an; 710119, China;
推荐引用方式
GB/T 7714
Guo, Lehui,Xin, Liwei,Li, Lili,et al. Effects of secondary electron emission yield properties on gain and timing performance of ALD-coated MCP[J]. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment,2021,1005.
APA Guo, Lehui.,Xin, Liwei.,Li, Lili.,Gou, Yongsheng.,Sai, Xiaofeng.,...&Tian, Jinshou.(2021).Effects of secondary electron emission yield properties on gain and timing performance of ALD-coated MCP.Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment,1005.
MLA Guo, Lehui,et al."Effects of secondary electron emission yield properties on gain and timing performance of ALD-coated MCP".Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 1005(2021).
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