Semiconductor devices on misoriented substrates
CANEAU CATHERINE G; NISHIYAMA NOBUHIKO; GURYANOV GEORGIY
2006-10-05
著作权人CORNING INCORPORATED
专利号WO2006058040A3
国家世界知识产权组织
文献子类发明申请
其他题名Semiconductor devices on misoriented substrates
英文摘要A semiconductor device (100) includes a misoriented substrate (240) having a surface area inclined in a range of about 8 to 40 degrees from the {100} plane. At least one highly doped P-type semiconductor layer (106) of a first semiconductor material doped with Carbon (C) is grown over the surface area. At least one highly doped N-type semiconductor layer (104) of a second semiconductor material is grown over the surface area and near the at least one highly doped P-type semiconductor layer (106). A moderately doped P-type layer (60) is grown over the surface area, wherein the moderately doped P-type layer 60 has a third semiconductor material doped with a dopant selected as a member from the group consisting of Zn, Be, Cd and Mg. The devices 100 include VCSELs having tunnel junctions (110) and semiconductor DBRs (230) composed of AlGaInAs/InP or GaInAs/InP layers (2308/2302) on misoriented substrates 240.
公开日期2006-10-05
申请日期2005-11-21
状态未确认
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/91690]  
专题半导体激光器专利数据库
作者单位CORNING INCORPORATED
推荐引用方式
GB/T 7714
CANEAU CATHERINE G,NISHIYAMA NOBUHIKO,GURYANOV GEORGIY. Semiconductor devices on misoriented substrates. WO2006058040A3. 2006-10-05.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace