Semiconductor devices on misoriented substrates | |
CANEAU CATHERINE G; NISHIYAMA NOBUHIKO; GURYANOV GEORGIY | |
2006-10-05 | |
著作权人 | CORNING INCORPORATED |
专利号 | WO2006058040A3 |
国家 | 世界知识产权组织 |
文献子类 | 发明申请 |
其他题名 | Semiconductor devices on misoriented substrates |
英文摘要 | A semiconductor device (100) includes a misoriented substrate (240) having a surface area inclined in a range of about 8 to 40 degrees from the {100} plane. At least one highly doped P-type semiconductor layer (106) of a first semiconductor material doped with Carbon (C) is grown over the surface area. At least one highly doped N-type semiconductor layer (104) of a second semiconductor material is grown over the surface area and near the at least one highly doped P-type semiconductor layer (106). A moderately doped P-type layer (60) is grown over the surface area, wherein the moderately doped P-type layer 60 has a third semiconductor material doped with a dopant selected as a member from the group consisting of Zn, Be, Cd and Mg. The devices 100 include VCSELs having tunnel junctions (110) and semiconductor DBRs (230) composed of AlGaInAs/InP or GaInAs/InP layers (2308/2302) on misoriented substrates 240. |
公开日期 | 2006-10-05 |
申请日期 | 2005-11-21 |
状态 | 未确认 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/91690] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | CORNING INCORPORATED |
推荐引用方式 GB/T 7714 | CANEAU CATHERINE G,NISHIYAMA NOBUHIKO,GURYANOV GEORGIY. Semiconductor devices on misoriented substrates. WO2006058040A3. 2006-10-05. |
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