Multicomponent barrier layers in quantum well active regions to enhance confinement and speed
JOHNSON, RALPH H.
2005-06-16
著作权人FINISAR CORPORATION
专利号US20050129078A1
国家美国
文献子类发明申请
其他题名Multicomponent barrier layers in quantum well active regions to enhance confinement and speed
英文摘要Multi-component barrier layers include formation of a GaAs layer and at least one adjacent GaAsN layer. The resulting multi-component barrier layer shape can provide enhanced (extended) offset for capture of holes and enhanced electrons. Other benefits include: a small amount of strain compensation; poorer spatial overlap of higher confined states reducing parasitics at high bias, with some small effect on the lowest confined states. Quantum wells and associated barriers layers can be grown with combinations of gallium, (Ga), arsenic, (As), nitrogen (N), aluminum (Al), antimony (Sb), phosphorous (P) and/or indium (In) placed within or about a typical GaAs substrate to achieve long wavelength VCSEL performance, e.g., with wavelengths over 1200 nm. Layers of strained quantum well material can also be supported by mechanical stabilizers.
公开日期2005-06-16
申请日期2004-10-01
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/91558]  
专题半导体激光器专利数据库
作者单位FINISAR CORPORATION
推荐引用方式
GB/T 7714
JOHNSON, RALPH H.. Multicomponent barrier layers in quantum well active regions to enhance confinement and speed. US20050129078A1. 2005-06-16.
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