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	Manufacture of diffraction grating
	UEMATSU YUTAKA; OKUDA HAJIME
	1983-09-13
著作权人	KOGYO GIJUTSUIN (JAPAN)
专利号	JP1983154285A
国家	日本
文献子类	发明申请
其他题名	Manufacture of diffraction grating
英文摘要	PURPOSE:To obtain a structure of periods of approx. 2,000Angstrom with good reproducibility by a method wherein a photo resist is exposed by interference and developed by two laser fluxes, further exposed and developed by a mercury lamp, and a substrate is etched with it as a mask. CONSTITUTION:After coating the photo resist 22 on the N-InP substrate 21, the He-Cd laser lights of wavelength 3,250Angstrom are irradiated from two directions, and exposure is performed by interference patterns. By successive development, the diffraction lattice having periods of approx. 2,000Angstrom is formed on the resist 22. In this case, the resist 22 often remains over the entire surface of the substrate 2 Next, the entire surface is exposed and developed by the non-interferential light source such as a mercury lamp. In this manner, the exposed part of the substrate 21 and the remnant resist appear alternately. When the substrate 21 is etched by the remnant resist 22, the unevenness of etching is not generated, and accordingly the diffraction grating having a structure of periods of approx. 2,000Angstrom can be manufactured with good reproducibility.
公开日期	1983-09-13
申请日期	1982-03-10
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/89520]
专题	半导体激光器专利数据库
作者单位	KOGYO GIJUTSUIN (JAPAN)
推荐引用方式 GB/T 7714	UEMATSU YUTAKA,OKUDA HAJIME. Manufacture of diffraction grating. JP1983154285A. 1983-09-13.

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