Surface emission semiconductor laser element | |
KONDO MASAFUMI; HAYAKAWA TOSHIRO; SUYAMA NAOHIRO; TAKAHASHI HISATOSHI | |
1989-04-26 | |
著作权人 | SHARP CORP |
专利号 | JP1989108789A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Surface emission semiconductor laser element |
英文摘要 | PURPOSE:To obtain high gain properties by composing a surface emission semiconductor laser element of a GaAs semiconductor substrate having a face azimuth 111 and an active layer having superlattice or quantum well structure formed onto a substrate and consisting of GaAs and AlGaAs. CONSTITUTION:A P-type GaAs buffer layer 2, a P-type Al0.7Ga0.3As clad layer 3, a multiple quantum well active layer 4 in which undoped GaAs quantum well layers and undoped Al0.2Ga0.8As barrier layers are superposed alternately in 200 layers and 199 layers, an N-type Al0.7 Ca0.3As clad layer 5 and an N-type GaAs contact layer 6 are grown continuously on a P-type GaAs substrate 1 having a face orientation 111 by using an MBE method. An SiN film 7 is shaped onto the contact layer 6, and an Zn diffusion layer 8 is formed up to the clad layer 3. The central section of the GaAs substrate is etched until the clad layer 3 is exposed, and a resonator is formed, reflecting mirrors 9, 10 functioning as electrodes in combination are shaped, and the whole is divided into chips. Positive voltage is applied to the electrode 10 for the chip and negative voltage to the electrode 9, and laser beams are extracted from the electrode 10 side. Accordingly, room-temperature continuous oscillation is enabled by low threshold currents. |
公开日期 | 1989-04-26 |
申请日期 | 1987-10-21 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/87792] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | SHARP CORP |
推荐引用方式 GB/T 7714 | KONDO MASAFUMI,HAYAKAWA TOSHIRO,SUYAMA NAOHIRO,et al. Surface emission semiconductor laser element. JP1989108789A. 1989-04-26. |
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