Manufacture of semiconductor laser resonator | |
KOBAYASHI KENICHI | |
1986-11-26 | |
著作权人 | NEC CORP |
专利号 | JP1986267388A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Manufacture of semiconductor laser resonator |
英文摘要 | PURPOSE:To improve mass productivity by forming semiconductor multilayer films which control reflectance before a semiconductor laser wafer is divided into bars. CONSTITUTION:Stripe patterns made of SiO2 are formed as etching-resistant films 2 on a double hetero structure semiconductor wafer 1 whose activation layer 10 is made of InGaAsP and cladding layer 20 is made of InP. The wafer 1 is then inserted into a reaction tube and etched with a mixture gas of hydrochloric acid with H2. The supply of the etching gas is discontinued and a mixture gas of AsH3 with PH3 is supplied and then a mixture of trimethyl indium (TMI) and PH3 and a mixture of TMI, trimethyl gallium, PH3 and AsH3 are alternately introduced to make high-resistance multilayer films 100 on the sides of steps. After that, electrodes are formed and the wafer 1 is cut into elements by cleaving, so that semiconductor lasers can be obtained. |
公开日期 | 1986-11-26 |
申请日期 | 1985-05-21 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/87427] |
专题 | 半导体激光器专利数据库 |
作者单位 | NEC CORP |
推荐引用方式 GB/T 7714 | KOBAYASHI KENICHI. Manufacture of semiconductor laser resonator. JP1986267388A. 1986-11-26. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论