Semiconductor laser device
OKAI MAKOTO; KAYANE NAOKI
1990-01-26
著作权人HITACHI LTD
专利号JP1990025086A
国家日本
文献子类发明申请
其他题名Semiconductor laser device
英文摘要PURPOSE:To obtain a distributed feedback type semiconductor laser whose light intensity is uniform in an axial direction by a method wherein a phase shifting region of a certain length is provided, whose phase shift amount is made to be expressed by pi + or -2pia (a=1, 2.). CONSTITUTION:A diffraction grating 2 is formed on an n-type InP substrate. For instance, provided that the period of the diffraction grating 2 is 240.00nm and the length of the phase shifting region is 100mum, the period of the phase shifting region is 44nm. By these processes, a phase shift of 5pi radians can be obtained between the right side and the left side of the phase shifting region. The following are epitaxially grown in succession through a liquid growth method after the diffraction grating has been formed: an n-type InGaAsP optical guide layer 4; a non-doped InGaAsP active layer 5; a p-type InGaAsP buffer layer 6; a p-type InP clad layer 7; and a non-doped InGaAsP cap layer 8. Next, a p-side electrode 9 and an n-side electrode 10 are formed through evaporation, and a cleavage is performed so as to make a resonator have a specified length, and then a reflection preventing film 11 of SiNx is formed to obtain a required laser.
公开日期1990-01-26
申请日期1988-07-13
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/86990]  
专题半导体激光器专利数据库
作者单位HITACHI LTD
推荐引用方式
GB/T 7714
OKAI MAKOTO,KAYANE NAOKI. Semiconductor laser device. JP1990025086A. 1990-01-26.
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