Method for fabricating a semiconductor laser diode
YOO, TAE KYUNG; CHO, MEOUNG WHAN; SEO, JU OK; LEEM, SHI JONG; NOH, MIN SOO
1996-05-22
著作权人LG ELECTRONICS INC.
专利号EP0713275A1
国家欧洲专利局
文献子类发明申请
其他题名Method for fabricating a semiconductor laser diode
英文摘要A method for fabricating a semiconductor laser for performing etching and regrowing of a semiconductor layer of the semiconductor laser in a process once by using a liquid phase etching which is a characteristic of a liquid phase epitaxy is executed by forming a DH-structured semiconductor layer on a substrate, forming a dielectric layer on the semiconductor layer, selectively etching the dielectric layer to expose a predetermined portion of the semiconductor layer, and selectively etching the exposed semiconductor layer using the dielectric layer as mask via the liquid phase etching method and successively regrowing the semiconductor layer on the etched portion via the liquid phase epitaxy. Thus, the DH structure is etched using a melt-back process to instantly execute the regrowth under the state of being unexposed to the air for easily providing the semiconductor laser of high reliability.
公开日期1996-05-22
申请日期1995-11-17
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/84866]  
专题半导体激光器专利数据库
作者单位LG ELECTRONICS INC.
推荐引用方式
GB/T 7714
YOO, TAE KYUNG,CHO, MEOUNG WHAN,SEO, JU OK,et al. Method for fabricating a semiconductor laser diode. EP0713275A1. 1996-05-22.
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