Semiconductor device
MIZUTA MASASHI
1989-11-30
著作权人NEC CORP
专利号JP1989296686A
国家日本
文献子类发明申请
其他题名Semiconductor device
英文摘要PURPOSE:To prevent the change of an oscillating wavelength due to the change of temperature and refractive index by a method wherein erbuim atoms are doped into silicon of an n-type gallium phosphide/silicon/p-type gallium phosphide double heterojunction formed on a gallium phosphide semiconductor substrate. CONSTITUTION:n-GaP is made to grow on an n-GaP substrate through a molecular ray epitaxial growth method. In this process, Ga and Gp are used as a Ga source and a P source respectively and a Si solid source making use of a Nudesene cell is used for doping. Next, Si is made to grow through an electron beam excitation and concurrently a Si layer is irradiated with erbium to be doped with it. Then, GaP is made to grow again and a Au/Be electrode and a Au/Ge electrode are evaporated on the front and rear of a crystal respectively, which is cleaved. By these processes, the change of an oscillating wavelength due to the change of temperature and refractive index caused by injection of carriers can be prevented.
公开日期1989-11-30
申请日期1988-05-25
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/84206]  
专题半导体激光器专利数据库
作者单位NEC CORP
推荐引用方式
GB/T 7714
MIZUTA MASASHI. Semiconductor device. JP1989296686A. 1989-11-30.
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