Semiconductor integrated light source
KIYOKU KATSUAKI; NOGUCHI ETSUO; OKAMOTO MINORU; MIKAMI OSAMU
1992-08-12
著作权人NIPPON TELEGR & TELEPH CORP
专利号JP1992221873A
国家日本
文献子类发明申请
其他题名Semiconductor integrated light source
英文摘要PURPOSE:To improve the yield of manufacturing an array element having a plurality of semiconductor lasers including uniform wavelength intervals by inclining the linear regions of stripelike waveguides of lasers with respect to the forming direction of a diffraction grating, and forming them nonparallel to each other. CONSTITUTION:A diffraction grating pattern is written on a p-type InGaAsP optical guide layer 4, and formed in an uneven state by etching to form the periods of diffraction gratings on the entire surface of a substrate in the same direction such as in a direction . Then, a p-type InP clad layer 5 and a p-type InGaAsP electrode layer 6 are continuously grown. Thereafter, a thin SiO2 film is formed on the entire surface, and thin films are formed in a plurality of stripes along a direction by photoetching. Here, angles formed between the stripes (a)-(d) corresponding to lasers La, Lb, Lc, Ld and a plane are respectively set to about 3.57, 2.91, 2.06, 0.0 deg. With the thin films as masks it is etched until it reaches the substrate 1 to form a laminate of an inverted mesa shape.
公开日期1992-08-12
申请日期1990-12-21
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/83867]  
专题半导体激光器专利数据库
作者单位NIPPON TELEGR & TELEPH CORP
推荐引用方式
GB/T 7714
KIYOKU KATSUAKI,NOGUCHI ETSUO,OKAMOTO MINORU,et al. Semiconductor integrated light source. JP1992221873A. 1992-08-12.
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