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	Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation
	Yuancheng Wang;  Hongwei Qu;  Yufei Wang;  Fengxin Dong;  Zhonghao Chen;  Wanhua Zheng
刊名	ACS Omega
	2019
卷号	4期号:23页码:20205-20211
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/29808]
专题	半导体研究所_固态光电信息技术实验室
推荐引用方式 GB/T 7714	Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng. Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation[J]. ACS Omega,2019,4(23):20205-20211.
APA	Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng.(2019).Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation.ACS Omega,4(23),20205-20211.
MLA	Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng."Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation".ACS Omega 4.23(2019):20205-20211.

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