Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film

doi:10.7567/1882-0786/ab29e4

	Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film
	Guo, Yunfeng; Zhang, Yuzhi; Chai, Xin; Zhang, Liangmiao; Wu, Lingnan; Cao, Yunzhen; Song, Lixin
刊名	APPLIED PHYSICS EXPRESS
	2019-07-01
卷号	12 期号:7
ISSN号	1882-0778
DOI	10.7567/1882-0786/ab29e4
文献子类	Article
英文摘要	We demonstrate a tunable broadband near-infrared absorber composed of VO2/Al2O3/ITO layers with a facile lithography-free method. Simulated and experimental spectra show that absorption bands with above 90% absorptance can be tuned from 1.62 similar to 2.42 mu m to 1.2 similar to 1.5 mu m by thermally induced VO2 phase transition. Furthermore, the absorber with VO2 in the intermediate state can yield a broadband perfect absorption over the wavelength range of 1.2 similar to 2.5 mu m. Besides high absorption performance can still be remained at the incident up to 70 degrees for both polarizations due to the presence of ultrathin layer of VO2 (lambda/52) in the absorber. (C) 2019 The Japan Society of Applied Physics
WOS研究方向	Physics
语种	英语
出版者	IOP PUBLISHING LTD
内容类型	期刊论文
源URL	[http://ir.sic.ac.cn/handle/331005/27009]
专题	中国科学院上海硅酸盐研究所
推荐引用方式 GB/T 7714	Guo, Yunfeng,Zhang, Yuzhi,Chai, Xin,et al. Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film[J]. APPLIED PHYSICS EXPRESS,2019,12(7).
APA	Guo, Yunfeng.,Zhang, Yuzhi.,Chai, Xin.,Zhang, Liangmiao.,Wu, Lingnan.,...&Song, Lixin.(2019).Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film.APPLIED PHYSICS EXPRESS,12(7).
MLA	Guo, Yunfeng,et al."Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film".APPLIED PHYSICS EXPRESS 12.7(2019).