Semiconductor laser device
OOTA YOICHIRO; TANAKA TOSHIO; TAKAMIYA SABURO
1987-10-08
著作权人MITSUBISHI ELECTRIC CORP
专利号JP1987229893A
国家日本
文献子类发明申请
其他题名Semiconductor laser device
英文摘要PURPOSE:To prevent deterioration of each required layer, such as oxidation. during the manufacturing of a laser device, by providing an etching control layer, etching a current blocking layer, removing the etching control layer, and forming a stripe shaped groove. CONSTITUTION:On a P-type GaAs substrate 1, an AlxGa1-xAs etching control layer 2 and an N-type GaAs current blocking layer 3 are sequentially grown by using an MO-CVD method. By using an etching mask 11, only the N-type GaAs current blocking layer 3 is etched with a selective etching liquid, by which GaAs is etched farther than AlGaAs. Thus a groove is formed. The mask 11 is removed. The etching control layer 2, which is exposed at the bottom part of the groove is removed by using an appropriate etching liquid. The chemically stable GaAs substrate 1 is exposed at the bottom part of the groove. Thus a stripe shaped groove 10 is formed. Required layers 4, 5, 6 and 7 are epitaxially grown by using the MO-CVD method.
公开日期1987-10-08
申请日期1986-03-11
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/82089]  
专题半导体激光器专利数据库
作者单位MITSUBISHI ELECTRIC CORP
推荐引用方式
GB/T 7714
OOTA YOICHIRO,TANAKA TOSHIO,TAKAMIYA SABURO. Semiconductor laser device. JP1987229893A. 1987-10-08.
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