Manufacture of semiconductor element
SAWAI MASAAKI; ITOU MITSUO
1984-12-27
著作权人HITACHI SEISAKUSHO KK
专利号JP1984232475A
国家日本
文献子类发明申请
其他题名Manufacture of semiconductor element
英文摘要PURPOSE:To manufacture high quality semiconductor laser elements by making grooves for cracking on one surface of a wafer which is cleaved from one end of the groove by an external force into narrow strips and separating these along the grooves for cracking. CONSTITUTION:In a wafer 1 which has multi-parallel buried hetero-construction in stripes, an N type clad layer 4, an active layer 2 and a P type clad layer 5 are formed sequentially on the substrate 3. Next, an inverted mesa type stripe part 6 is formed. On the etching groove of the main surface of the wafer 1, a P type block layer 7 and an N type buried layer 8 are grown. On the main surface, an insulation film 9 is also partially formed. On the back surface of the wafer 1, V type grooves for cracking are provided. On one end of the wafer 1, an external force of constant interval is applied to crack along the cracking plane of the crystal into separate strips.
公开日期1984-12-27
申请日期1983-06-15
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/80227]  
专题半导体激光器专利数据库
作者单位HITACHI SEISAKUSHO KK
推荐引用方式
GB/T 7714
SAWAI MASAAKI,ITOU MITSUO. Manufacture of semiconductor element. JP1984232475A. 1984-12-27.
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