Manufacture of semiconductor element | |
SAWAI MASAAKI; ITOU MITSUO | |
1984-12-27 | |
著作权人 | HITACHI SEISAKUSHO KK |
专利号 | JP1984232475A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Manufacture of semiconductor element |
英文摘要 | PURPOSE:To manufacture high quality semiconductor laser elements by making grooves for cracking on one surface of a wafer which is cleaved from one end of the groove by an external force into narrow strips and separating these along the grooves for cracking. CONSTITUTION:In a wafer 1 which has multi-parallel buried hetero-construction in stripes, an N type clad layer 4, an active layer 2 and a P type clad layer 5 are formed sequentially on the substrate 3. Next, an inverted mesa type stripe part 6 is formed. On the etching groove of the main surface of the wafer 1, a P type block layer 7 and an N type buried layer 8 are grown. On the main surface, an insulation film 9 is also partially formed. On the back surface of the wafer 1, V type grooves for cracking are provided. On one end of the wafer 1, an external force of constant interval is applied to crack along the cracking plane of the crystal into separate strips. |
公开日期 | 1984-12-27 |
申请日期 | 1983-06-15 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/80227] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | HITACHI SEISAKUSHO KK |
推荐引用方式 GB/T 7714 | SAWAI MASAAKI,ITOU MITSUO. Manufacture of semiconductor element. JP1984232475A. 1984-12-27. |
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