Semiconductor laser | |
FUJISAWA HIROKAZU | |
1988-10-20 | |
著作权人 | NEC CORP |
专利号 | JP1988253689A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Semiconductor laser |
英文摘要 | PURPOSE:To reduce thermal stress applied to an active layer by arranging clad layers in different thickness adjacent to a section in the vicinity of a current constriction section. CONSTITUTION:An n-type GaAs block layer 2 is formed onto a p-type GaAs substrate 1, a groove as a current constriction section is shaped, a p-type Ga0.55 Al0.45As clad layer 3 is laminated onto the whole surface, and the current constriction section 10 is formed. A p-type Ga0.85Al0.15As active layer 4 and an n-type Ga0.55Al0.45As clad layer 5 are grown in succession. The clad layer 5 is etched by a striped mask shaped conformed to the center of the current constriction section 10 to form a stress relaxation layer 9. Lastly, an n-type GaAs cap layer 6 is shaped, and electrodes 7, 8 are formed. Accordingly, the stress relaxation layer 9 is formed, thus reducing stress in the active layer, particularly, stress near the current constriction section. |
公开日期 | 1988-10-20 |
申请日期 | 1987-04-10 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/77874] |
专题 | 半导体激光器专利数据库 |
作者单位 | NEC CORP |
推荐引用方式 GB/T 7714 | FUJISAWA HIROKAZU. Semiconductor laser. JP1988253689A. 1988-10-20. |
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