Manufacture of semiconductor laser
HAMADA TAKESHI; ITOU KUNIO; WADA MASARU
1984-12-20
著作权人MATSUSHITA DENKI SANGYO KK
专利号JP1984227182A
国家日本
文献子类发明申请
其他题名Manufacture of semiconductor laser
英文摘要PURPOSE:To obtain a uniform active layer by a method wherein, when a first N type GaAlAs clad layer, which constitutes a semiconductor laser, is formed, a dopant for the clad layer and its concentration and growth temperature are specified. CONSTITUTION:Two ridges, which are parallel to each other at an interval, are formed on the surface of an N type GaAs substrate 1 and a first N type Ga0.57Al0.43As clad layer 2 is epitaxially grown on the total surface including the whole surfaces of the two ridges. Then, an undoped Ga0.92Al0.08As active layer 3, a second P type Ga0.57Al0.43As clad layer 4 and an N type GaAs cap layer 5 are laminatedly formed thereon and the whole surface of the layer 5 is covered with an insulating film 9. A window is opened corresponding to the space between the ridges, a Zn is diffused, a P type region 8, which intrudes in the layer 4, is provided and a P type electrode film 6 is coated while being made to abot against the region 8. In this constitution, a Te is used as a dopant for the layer 2 and its concentration and growth temperature are respectively set at 2X10-2X10/cm and 800-870 deg.C.
公开日期1984-12-20
申请日期1983-06-08
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/75832]  
专题半导体激光器专利数据库
作者单位MATSUSHITA DENKI SANGYO KK
推荐引用方式
GB/T 7714
HAMADA TAKESHI,ITOU KUNIO,WADA MASARU. Manufacture of semiconductor laser. JP1984227182A. 1984-12-20.
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