Formation of electrode
SASAKI TATSUYA; INAI MOTOHIKO
1987-12-08
著作权人NEC CORP
专利号JP1987282480A
国家日本
文献子类发明申请
其他题名Formation of electrode
英文摘要PURPOSE:To form a platinum stripe electrode to enable continuous oscillation at a high temperature, and to enhance the characteristic of an element by a method wherein after a part of a dierectric film is removed in a stripe type to expose the surface of a semiconductor, platinum is evaporated on the whole surface, alloying treatment is performed, and then a platinum layer on the dielectric film is removed. CONSTITUTION:A clad layer 6, an active layer 5, a clad layer 4 and a cap layer 3 are grown in order on a substrate 7, an SiO2 oxide film is laminated thereon, and photolithography is performed using a mask to form stripe type grooves. The wafer and ZnP2, ZnAs2, InP are put in a quartz ampoule to be sealed in a vacuum, Zn is diffused up to the middle of the p-type clad layer 4, and the SiO2 film is removed. An SiO2 film is adhered again, stripe type grooves of two pieces are formed performing positioning of a mask, and mesa etching is performed using a Br2-CH3OH solution. Then an SiO2 film 10 is adhered again, positioning of a mask is performed, and stripes are formed. Pt is evaporated thereon, and after alloying is performed, the platinum layer on the dielectric film is removed.
公开日期1987-12-08
申请日期1986-05-30
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/67549]  
专题半导体激光器专利数据库
作者单位NEC CORP
推荐引用方式
GB/T 7714
SASAKI TATSUYA,INAI MOTOHIKO. Formation of electrode. JP1987282480A. 1987-12-08.
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