Manufacture of grating | |
HIRATA SHOJI | |
1987-07-10 | |
著作权人 | SONY CORP |
专利号 | JP1987155580A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Manufacture of grating |
英文摘要 | PURPOSE:To manufacture easily and with excellent reproducibility, a grating having a phase shift region corresponding with lambda/4, by forming a photo resist in the manner in which the top part of a grating formed on the upper layer surface of a semiconductor layer having a step difference is exposed, and performing an etching applying the resist as a mask. CONSTITUTION:A step difference 3b is formed by constituting a groove 3a having a period 2L, width L and depth of (h) on the surface of a p-InGaAsP layer 3. After a first grating 5 is formed on the surface of the step difference by a holographic exposure, the first grating 5 having a lambda/4-phase shift region 5b is formed by performing an etching which applies a photo resist 6 formed on the first grating as a mask. A p-InP layer 7, clad layer, is formed thereon, and an objective DFB laser is completed by means of, for example, cleaving along a dot and dash chain line. Consequently, the DFB laser capable of single longitudinal mode oscillation can be manufactured with excellent reproducibility, while a complicated and different technology such as electron beam lithography and the like is not necessary for forming the region 5b. |
公开日期 | 1987-07-10 |
申请日期 | 1985-12-27 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/67214] |
专题 | 半导体激光器专利数据库 |
作者单位 | SONY CORP |
推荐引用方式 GB/T 7714 | HIRATA SHOJI. Manufacture of grating. JP1987155580A. 1987-07-10. |
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