Manufacture of algainp semiconductor laser | |
IKEDA MASAO | |
1986-07-05 | |
著作权人 | ソニー株式会社 |
专利号 | JP1986147592A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Manufacture of algainp semiconductor laser |
英文摘要 | PURPOSE:To obtain a stable semiconductor laser with good characteristics by a method wherein, before an irregular processing is performed, the luminescent mechanism part is formed of an organic metal of an AlGaInP semiconductor or by the metal vapor-phase growth method. CONSTITUTION:A buffer layer 22, a first clad layer 23, an active layer 24 and a second clad layer 25 are made to grow in order on the main surface of an n-type GaAs single crystal substrate 21, and further successively, a protective semiconductor layer 26 for the second clad layer 25 is made to grow on the second clad layer 25 and a current constricting layer 27 is made to grow there on. The buffer layer 22, the first clad layer 23 and the current constricting layer 27 have the same n-type conductive type as that of the substrate 21, and the second clad layer 25 and the protective semiconductor layer 26 for the second clad layer 25 have the p-type conductive type inverse to the n-type conductive of the substrate 2 An electrode 29 on one side is ohmically formed by adhesion on a cap layer 28 and an electrode 30 on the other side is ohmically formed by adhesion on the back surface of the substrate 2 |
公开日期 | 1986-07-05 |
申请日期 | 1984-12-21 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/64211] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | ソニー株式会社 |
推荐引用方式 GB/T 7714 | IKEDA MASAO. Manufacture of algainp semiconductor laser. JP1986147592A. 1986-07-05. |
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