The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films

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	The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films
	Wang Q(王权)1,2; Hu R(胡然)1; Shao Y(邵银)1
刊名	Journal of Applied Physics
	2012
卷号	112 期号:4 页码:044512(1-8)
ISSN号	0021-8979
通讯作者	王权
英文摘要	Flat, low-stress, boron-doped polysilicon thin films were prepared on crystalline silicon substrates by low pressure chemical vapor deposition. The films’ surface morphologies and internal stresses were investigated using scanning probe microscope and AFM-Raman, respectively. The elastic modulus (E) was measured along with the hardness (H) using the nanoindentation technique. It was found that films deposited at the highest temperature had the largest grain size and surface roughness. The internal stresses in the films are tensile stresses, which are not uniform over the surfaces and present the gradient distribution along the thickness. Both the surface roughness and the internal stresses affect the nanoindentation tests. The tensile stresses in the films give extra forces to the diamond indenter, so the depths of penetration should be larger than those obtained from the films with stress free for a given load, which leads to an underestimation of E as well as H. But under the applied conditions, the increasing surface roughness can not only lead to the reductions of depths of penetration but also cause the measurement values of E and H to be more dispersive and uncertain. So for a given load, if the maximum depth of penetration in the rough surface is smaller than that in the smooth surface, the surface roughness is the main factor affecting the nanoindentation tests. On the contrary, the tensile stress is the main factor.
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	the National Science Foundation of China (No. 51175238);the Opening Foundation of Automobile Engineering Key Laboratory of Jiangsu Province, Jiangsu University (No. QC201108);the Opening Foundation of Optical Fabrication Science and Technology Key Laboratory of Jiangsu Province (No. GZ201008)
语种	英语
WOS记录号	WOS:000308410100098
公开日期	2013-07-12
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/3347]
专题	兰州化学物理研究所_固体润滑国家重点实验室
作者单位	1.Jiangsu Univ, Sch Mech Engn, Zhenjiang 212013, Peoples R China 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式 GB/T 7714	Wang Q,Hu R,Shao Y. The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films[J]. Journal of Applied Physics,2012,112(4):044512(1-8).
APA	Wang Q,Hu R,&Shao Y.(2012).The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films.Journal of Applied Physics,112(4),044512(1-8).
MLA	Wang Q,et al."The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films".Journal of Applied Physics 112.4(2012):044512(1-8).