Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 固体润滑国家重点实验室

	Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering
	Lv YH(吕艳红)1,2; Ji L(吉利)1 ; Liu XH(刘晓红)1 ; Li HX(李红轩)1 ; Zhou HD(周惠娣)1 ; Chen JM(陈建敏)1
刊名	Applied Surface Science
	2012
卷号	258 期号:8 页码:3864-3870
关键词	CrAlN films Microstructure Mechanical properties Corrosion resistance
ISSN号	0169-4332
通讯作者	李红轩
英文摘要	The CrAlN films were deposited on silicon and stainless steel substrates by unbalanced magnetron sputtering system. The influence of substrate bias on deposition rate, composition, structure, morphology and properties of the CrAlN films was investigated. The results showed that, with the increase of the substrate bias voltage, the deposition rate decreased accompanied by a change of the preferred orientation of the CrAlN film from (220) to (200). The grain size and the average surface roughness of the CrAlN films declined as the bias voltage increases above -100 V. The morphology of the films changed from obviously columnar to dense glass-like structure with the increase of the bias voltage from -50 to -250 V. Meanwhile, the films deposited at moderate bias voltage had better mechanical and tribological properties, while the films deposited at higher bias voltage showed better corrosion resistance. It was found that the corrosion resistance improvement was not only attributed to the low pinhole density of the film, but also to chemical composition of films.
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	the National Natural Science Foundation of China (Grant no. 50705093);the Innovative Group Foundation from NSFC (Grant no. 50421502)
语种	英语
WOS记录号	WOS:000300185800083
公开日期	2013-07-12
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/3288]
专题	兰州化学物理研究所_固体润滑国家重点实验室兰州化学物理研究所_先进润滑与防护材料研究发展中心
作者单位	1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Lv YH,Ji L,Liu XH,et al. Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering[J]. Applied Surface Science,2012,258(8):3864-3870.
APA	Lv YH,Ji L,Liu XH,Li HX,Zhou HD,&Chen JM.(2012).Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering.Applied Surface Science,258(8),3864-3870.
MLA	Lv YH,et al."Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering".Applied Surface Science 258.8(2012):3864-3870.