Methods and apparatus for performing microanalytical techniques using photolithographically fabricated substrates having narrow band optical emission capability | |
LAWANDY, NABIL M. | |
2000-08-08 | |
著作权人 | SPECTRA SCIENCE CORPORATION |
专利号 | US6100973 |
国家 | 美国 |
文献子类 | 授权发明 |
其他题名 | Methods and apparatus for performing microanalytical techniques using photolithographically fabricated substrates having narrow band optical emission capability |
英文摘要 | A substrate (10) has a surface (10A) containing at least one photolithographically defined feature (12, 14A, 14B) for containing a gas or fluid of interest. The substrate further includes at least one region (10B) containing a selected optical gain medium in combination with scattering particles or sites for generating light having a desired wavelength in response to a pump source, such as a laser (20) or a lamp. The at least one region is optically coupled to the at least one photolithographically defined feature for illuminating a portion of the sample with the light having the desired wavelength. The substrate may be comprised of a glass, a polymer, or a semiconductor. In one embodiment at least one optical waveguide (16) is formed in the substrate for conveying light from the pump source to the region containing the gain medium and scatterers. In further embodiments of this invention the pump source can be integrated into the substrate as a laser diode (18A), as may at least one photodetector (18B) for detecting a presence of light emitted by or transmitted through the sample in response to said light having the desired wavelength. Wavelength encoded features can also provided on a sample plate and subsequently identified, as can beads used in combinatorial chemistry and other applications. |
公开日期 | 2000-08-08 |
申请日期 | 1998-04-13 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/46261] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | SPECTRA SCIENCE CORPORATION |
推荐引用方式 GB/T 7714 | LAWANDY, NABIL M.. Methods and apparatus for performing microanalytical techniques using photolithographically fabricated substrates having narrow band optical emission capability. US6100973. 2000-08-08. |
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