QQ客服 官方微博 反馈留言

	Substrate holder for MOCVD
	NOBUAKI, , KANENO; HIROTAKA, , KIZUKI; MASAYOSHI, , TAKEMI; KENZO, , MORI
	1997-09-24
著作权人	MITSUBISHI DENKI KABUSHIKI KAISHA
专利号	GB2277748B
国家	英国
文献子类	授权发明
其他题名	Substrate holder for MOCVD
英文摘要	A substrate holder employed for MOCVD and supporting a wafer on which crystal growth proceeds includes a molybdenum holder body 1, a GaAs polycrystalline film 2 with a flat surface grown on a part of the surface of the molybdenum holder body where the wafer is absent, and an InP polycrystalline film 3 grown on the GaAs polycrystalline film. Each of the polycrystalline films is grown to a thickness of 0.3 mu m or more at a temperature higher than the epitaxial growth temperature of 575 DEG C.; During the MOCVD process, the emissivity of the molybdenum substrate holder is settled at a value near the emissivity of the wafer on the substrate holder and, therefore, the decomposition ratio of the PH3 gas on the substrate holder is settled at a value near the decomposition ratio on the wafer, whereby the variation of the incorporation ratio of P atoms in the InGaAsP mixed crystal, i.e., the variation of the composition of the InGaAsP mixed crystal, is reduced and the run-to-run variation of the composition of the mixed crystal is reduced. In further embodiments an InGaAsP, at a temperature higher than 575 DEG C, and InP, at 400 - 550 DEG C, may be deposited on the molybdenum. The MOCVD apparatus includes a high-speed rotatable susceptor 200b; a substrate holder 300b disposed on the front surface of the susceptor; means for heating said susceptor; an inlet for supplying source gases; and a plurality of rotatable wafer trays 600a disposed on the front surface of the susceptor via the substrate holder, each wafer tray having a plurality of wings 600a1 to which a gas flow is applied.
公开日期	1997-09-24
申请日期	1994-03-17
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/44503]
专题	半导体激光器专利数据库
作者单位	MITSUBISHI DENKI KABUSHIKI KAISHA
推荐引用方式 GB/T 7714	NOBUAKI, , KANENO,HIROTAKA, , KIZUKI,MASAYOSHI, , TAKEMI,et al. Substrate holder for MOCVD. GB2277748B. 1997-09-24.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。