Semiconductor light emitting device and manufacturing method therefor
KAMETANI, EIJI; INOGUCHI, YUKARI; WATANABE, NOBUYUKI; MURAKAMI, TETSUROH
著作权人XIAMEN SAN'AN OPTOELECTRONICS CO., LTD.
专利号US20070007543A1
国家美国
文献子类发明申请
其他题名Semiconductor light emitting device and manufacturing method therefor
英文摘要A semiconductor light emitting device in the present invention is formed by laminating an epitaxial layer 30 including an AlGaInP active layer and a second wafer 23 which transmits light derived from the active layer. The crystal axes of the epitaxial layer 30 and the second wafer 23 are generally aligned with each other and are in the range of −15° to +15° with respect to a lateral face {100} of the second wafer 23. This semiconductor light emitting device, which is a joining type with high external emission efficiency, allows uniform wafer bonding to be achieved over the entire wafer face with ease and with a high yield without causing bonding failure and wafer cracks.
公开日期2007-01-11
申请日期2006-06-30
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/43532]  
专题半导体激光器专利数据库
作者单位XIAMEN SAN'AN OPTOELECTRONICS CO., LTD.
推荐引用方式
GB/T 7714
KAMETANI, EIJI,INOGUCHI, YUKARI,WATANABE, NOBUYUKI,et al. Semiconductor light emitting device and manufacturing method therefor. US20070007543A1.
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