In-Situ Boron and Aluminum Doping and Their Memory Effects in 4H-SiC Homoepitaxial Layers Grown by Hot-Wall LPCVD

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	In-Situ Boron and Aluminum Doping and Their Memory Effects in 4H-SiC Homoepitaxial Layers Grown by Hot-Wall LPCVD
	Sun, GS ; Zhao, YM ; Wang, L ; Wang, L ; Zhao, WS ; Liu, XF ; Ji, G ; Zeng, YP
	2009
会议名称	international conference on silicon carbide and related materials
会议日期	oct 14-19, 2007
会议地点	otsu, japan
关键词	in-situ doping boron aluminum memory effects hot-wall LPCVD 4H-SiC
页码	pts 1 and 2,600-603,: 147-150 part 1-2
通讯作者	sun, gs, chinese acad sci, inst semicond, novel semicond mat lab, beijing 100083, peoples r china.
中文摘要	the in-situ p-type doping of 4h-sic grown on off-oriented (0001) 4h-sic substrates was performed with trimethylaluminum (tma) and/or diborane (b2h6) as the dopants. the incorporations of al and b atoms and their memory effects and the electrical properties of p-type 4h-sic epilayers were characterized by secondary ion mass spectroscopy (sims) and hall effect measurements, respectively. both al- and b-doped 4h-sic epilayers were p-type conduction. it was shown that the profiles of the incorporated boron and aluminum concentration were in agreement with the designed tma and b2h6 flow rate diagrams. the maximum hole concentration for the al doped 4h-sic was 3.52x10(20) cm(-3) with hall mobility of about 1 cm(2)/vs and resistivity of 1.6 similar to 2.2x10(-2) omega cm. the heavily boron-doped 4h-sic samples were also obtained with b2h6 gas flow rate of 5 sccm, yielding values of 0.328 omega cm for resistivity, 5.3x10(18) cm(-3) for hole carrier concentration, and 7 cm(2)/vs for hole mobility. the doping efficiency of al in sic is larger than that of b. the memory effects of al and b were investigated in undoped 4h-sic by using sims measurement after a few run of doped 4h-sic growth. it was clearly shown that the memory effect of al is stronger than that of b. it is suggested that p-type 4h-sic growth should be carried out in a separate reactor, especially for al doping, in order to avoid the join contamination on the subsequent n-type growth. 4h-sic pin diodes were fabricated by using heavily b doped epilayers. preliminary results of pin diodes with blocking voltage of 300 v and forward voltage drop of 3.0 v were obtained.
英文摘要	the in-situ p-type doping of 4h-sic grown on off-oriented (0001) 4h-sic substrates was performed with trimethylaluminum (tma) and/or diborane (b2h6) as the dopants. the incorporations of al and b atoms and their memory effects and the electrical properties of p-type 4h-sic epilayers were characterized by secondary ion mass spectroscopy (sims) and hall effect measurements, respectively. both al- and b-doped 4h-sic epilayers were p-type conduction. it was shown that the profiles of the incorporated boron and aluminum concentration were in agreement with the designed tma and b2h6 flow rate diagrams. the maximum hole concentration for the al doped 4h-sic was 3.52x10(20) cm(-3) with hall mobility of about 1 cm(2)/vs and resistivity of 1.6 similar to 2.2x10(-2) omega cm. the heavily boron-doped 4h-sic samples were also obtained with b2h6 gas flow rate of 5 sccm, yielding values of 0.328 omega cm for resistivity, 5.3x10(18) cm(-3) for hole carrier concentration, and 7 cm(2)/vs for hole mobility. the doping efficiency of al in sic is larger than that of b. the memory effects of al and b were investigated in undoped 4h-sic by using sims measurement after a few run of doped 4h-sic growth. it was clearly shown that the memory effect of al is stronger than that of b. it is suggested that p-type 4h-sic growth should be carried out in a separate reactor, especially for al doping, in order to avoid the join contamination on the subsequent n-type growth. 4h-sic pin diodes were fabricated by using heavily b doped epilayers. preliminary results of pin diodes with blocking voltage of 300 v and forward voltage drop of 3.0 v were obtained.; zhangdi于2010-03-09批量导入; made available in dspace on 2010-03-09t07:08:18z (gmt). no. of bitstreams: 1 304.pdf: 279890 bytes, checksum: 531982fa6101903ffdc36608f0ab7a01 (md5) previous issue date: 2009; japan soc appl phys.; assoc promot elect, elect & informat engn.; ceram soc japan.; ieee eds, kansai chapter.; ieej.; inst elect, informat & commun engineers.; japanese assoc crystal growth.; surface sci soc japan.; vacuum soc japan.; [sun, guosheng; zhao, yongmei; wang, liang; wang, lei; zhao, wanshun; liu, xingfang; ji, gang; zeng, yiping] chinese acad sci, inst semicond, novel semicond mat lab, beijing 100083, peoples r china
收录类别	CPCI-S
会议主办者	japan soc appl phys.; assoc promot elect, elect & informat engn.; ceram soc japan.; ieee eds, kansai chapter.; ieej.; inst elect, informat & commun engineers.; japanese assoc crystal growth.; surface sci soc japan.; vacuum soc japan.
会议录	silicon carbide and related materials 2007
会议录出版者	trans tech publications ltd ; laublsrutistr 24, ch-8717 stafa-zurich, switzerland
会议录出版地	laublsrutistr 24, ch-8717 stafa-zurich, switzerland
学科主题	半导体材料
语种	英语
ISSN号	0255-5476
内容类型	会议论文
源URL	[http://ir.semi.ac.cn/handle/172111/8334]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Sun, GS,Zhao, YM,Wang, L,et al. In-Situ Boron and Aluminum Doping and Their Memory Effects in 4H-SiC Homoepitaxial Layers Grown by Hot-Wall LPCVD[C]. 见:international conference on silicon carbide and related materials. otsu, japan. oct 14-19, 2007.