| A parallel alignment device with dynamic force compensation for nanoimprint lithography | |
| Chen, Weihai; Du, Chong; Wu, Yunjie; Chen, Wenjie; Yuan, Mei | |
| 刊名 | REVIEW OF SCIENTIFIC INSTRUMENTS
 |
| 2014 | |
| 卷号 | 85页码:035107 |
| ISSN号 | 0034-6748 |
| DOI | 10.1063/1.4867665 |
| URL标识 | 查看原文 |
| 收录类别 | SCIE ; EI ; PUBMED |
| WOS记录号 | WOS:000335920400064 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/6550587 |
| 专题 | 北京航空航天大学 |
| 推荐引用方式 GB/T 7714 | Chen, Weihai,Du, Chong,Wu, Yunjie,et al. A parallel alignment device with dynamic force compensation for nanoimprint lithography[J]. REVIEW OF SCIENTIFIC INSTRUMENTS,2014,85:035107. |
| APA | Chen, Weihai,Du, Chong,Wu, Yunjie,Chen, Wenjie,&Yuan, Mei.(2014).A parallel alignment device with dynamic force compensation for nanoimprint lithography.REVIEW OF SCIENTIFIC INSTRUMENTS,85,035107. |
| MLA | Chen, Weihai,et al."A parallel alignment device with dynamic force compensation for nanoimprint lithography".REVIEW OF SCIENTIFIC INSTRUMENTS 85(2014):035107. |
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