The new exploration for proton-implanted silicon: the conversion of a surface-region-purification-induced p-n junction into a p-i-n electrical structure approaching silicon on insulator
Li JM
刊名semiconductor science and technology
2000
卷号15期号:2页码:l6-l9
关键词ION-IMPLANTATION HYDROGEN OXYGEN
ISSN号0268-1242
通讯作者li jm,chinese acad sci,inst semicond,pob 912,beijing 100083,peoples r china.
中文摘要a surface-region-purification-induced p-n junction, a puzzle discovered at brookhaven national laboratory, in a silicon-on-defect-layer (sodl) material has been explored by carrying out various annealing conditions and subsequent measurements on electrical properties. the origin of the pn junction has been experimentally investigated. furthermore, the p-n junction has been transformed into a p-i-n electrical structure by adding a high temperature annealing process to the previously used sodl procedure, making the sodl material approach silicon on insulator (soi). the control of the initial oxygen amount in the silicon material is suggested to be critical for the experimental results.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/12680]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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GB/T 7714
Li JM. The new exploration for proton-implanted silicon: the conversion of a surface-region-purification-induced p-n junction into a p-i-n electrical structure approaching silicon on insulator[J]. semiconductor science and technology,2000,15(2):l6-l9.
APA Li JM.(2000).The new exploration for proton-implanted silicon: the conversion of a surface-region-purification-induced p-n junction into a p-i-n electrical structure approaching silicon on insulator.semiconductor science and technology,15(2),l6-l9.
MLA Li JM."The new exploration for proton-implanted silicon: the conversion of a surface-region-purification-induced p-n junction into a p-i-n electrical structure approaching silicon on insulator".semiconductor science and technology 15.2(2000):l6-l9.
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