Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy
Xu B; Ye XL
刊名journal of crystal growth
2000
卷号212期号:1-2页码:356-359
关键词rapid thermal annealing InGaAs/GaAs quantum dots molecular beam epitaxy LUMINESCENCE FABRICATION GAAS(100) INTERFACE LASER LAYER
ISSN号0022-0248
通讯作者jiang wh,chinese acad sci,inst semicond,lab semicond mat sci,pob 912,beijing 100083,peoples r china.
中文摘要postgrowth rapid thermal annealing was performed on ingaas/gaas quantum dots grown by molecular beam epitaxy. the blue shift of the emission peak and the narrowing of the luminescence line width are observed at lower annealing temperature. however, when the annealing temperature is increased to 850 degrees c, the emission line width becomes larger. the tem image of this sample shows that the surface becomes rough, and some large clusters are formed, which is due to the interdiffusion of in, ga atoms at the ingaas/gaas interface and to the strain relaxation. the material is found to degrade dramatically when the annealing temperature is further increased to 900 degrees c, while emission from quantum dots can still be detected, along with the appearance of the emission from excited state. (c) 2000 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/12630]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Xu B,Ye XL. Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy[J]. journal of crystal growth,2000,212(1-2):356-359.
APA Xu B,&Ye XL.(2000).Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy.journal of crystal growth,212(1-2),356-359.
MLA Xu B,et al."Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy".journal of crystal growth 212.1-2(2000):356-359.
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