Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy | |
Xu B![]() ![]() | |
刊名 | journal of crystal growth
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2000 | |
卷号 | 212期号:1-2页码:356-359 |
关键词 | rapid thermal annealing InGaAs/GaAs quantum dots molecular beam epitaxy LUMINESCENCE FABRICATION GAAS(100) INTERFACE LASER LAYER |
ISSN号 | 0022-0248 |
通讯作者 | jiang wh,chinese acad sci,inst semicond,lab semicond mat sci,pob 912,beijing 100083,peoples r china. |
中文摘要 | postgrowth rapid thermal annealing was performed on ingaas/gaas quantum dots grown by molecular beam epitaxy. the blue shift of the emission peak and the narrowing of the luminescence line width are observed at lower annealing temperature. however, when the annealing temperature is increased to 850 degrees c, the emission line width becomes larger. the tem image of this sample shows that the surface becomes rough, and some large clusters are formed, which is due to the interdiffusion of in, ga atoms at the ingaas/gaas interface and to the strain relaxation. the material is found to degrade dramatically when the annealing temperature is further increased to 900 degrees c, while emission from quantum dots can still be detected, along with the appearance of the emission from excited state. (c) 2000 elsevier science b.v. all rights reserved. |
学科主题 | 半导体材料 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2010-08-12 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/12630] ![]() |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Xu B,Ye XL. Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy[J]. journal of crystal growth,2000,212(1-2):356-359. |
APA | Xu B,&Ye XL.(2000).Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy.journal of crystal growth,212(1-2),356-359. |
MLA | Xu B,et al."Annealing effect on the surface morphology and photoluminescence of InGaAs/GaAs quantum dots grown by molecular beam epitaxy".journal of crystal growth 212.1-2(2000):356-359. |
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