Comparison of field effect transistor characteristics between space-grown and earth-grown gallium arsenide single crystal substrates
Chen NF ; Zhong XR ; Lin LY ; Zhang M ; Wang YS ; Bai XW ; Zhao J
刊名applied physics letters
2001
卷号78期号:4页码:478-479
关键词FLOATING-ZONE GROWTH ZERO GRAVITY MICROGRAVITY STOICHIOMETRY SEGREGATION SILICON GE
ISSN号0003-6951
通讯作者chen nf,chinese acad sci,inst semicond,lab semicond mat sci,pob 912,beijing 100083,peoples r china.
中文摘要semi-insulating gallium arsenide single crystal grown in space has been used in fabricating low noise field effect transistors and analog switch integrated circuits by the direct ion-implantation technique. all key electrical properties of these transistors and integrated circuits have surpassed those made from conventional earth-grown gallium arsenide. this result shows that device-grade space-grown semiconducting single crystal has surpassed the best terrestrial counterparts. (c) 2001 american institute of physics.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/12324]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Chen NF,Zhong XR,Lin LY,et al. Comparison of field effect transistor characteristics between space-grown and earth-grown gallium arsenide single crystal substrates[J]. applied physics letters,2001,78(4):478-479.
APA Chen NF.,Zhong XR.,Lin LY.,Zhang M.,Wang YS.,...&Zhao J.(2001).Comparison of field effect transistor characteristics between space-grown and earth-grown gallium arsenide single crystal substrates.applied physics letters,78(4),478-479.
MLA Chen NF,et al."Comparison of field effect transistor characteristics between space-grown and earth-grown gallium arsenide single crystal substrates".applied physics letters 78.4(2001):478-479.
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