Temperature dependence of photoluminescence of flat and undulated SiGe/Si multiple quantum wells
Cheng BW ; Zhang JG ; Zuo YH ; Mao RW ; Huang CJ ; Luo LP ; Yao F ; Wang QM
刊名international journal of modern physics b
2002
卷号16期号:28-29页码:4211-4214
关键词SI-GE ALLOYS GROWTH LAYERS
ISSN号0217-9792
通讯作者cheng bw,chinese acad sci,inst semicond,beijing 100083,peoples r china.
中文摘要photoluminescence (pl) of strained sige/si multiple quantum wells (mqw) with flat and undulated sige well layers was studied at different temperature. with elevated temperature from 10k, the no-phonon (np) peak of the sige layers in the flat sample has firstly a blue shift due to the dominant transition converting from bound excitons (be) to free excitons (fe), and then has a red shift when the temperature is higher than 30k because of the narrowing of the band gap. in the undulated sample, however, monotonous blue shift was observed as the temperature was elevated from 10 k to 287 k. the thermally activated electrons, confined in si due to type-ii band alignment, leak into the sige crest regions, and the leakage is enhanced with the elevated temperature. it results in a blue shift of the sige luminescence spectra.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/11704]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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GB/T 7714
Cheng BW,Zhang JG,Zuo YH,et al. Temperature dependence of photoluminescence of flat and undulated SiGe/Si multiple quantum wells[J]. international journal of modern physics b,2002,16(28-29):4211-4214.
APA Cheng BW.,Zhang JG.,Zuo YH.,Mao RW.,Huang CJ.,...&Wang QM.(2002).Temperature dependence of photoluminescence of flat and undulated SiGe/Si multiple quantum wells.international journal of modern physics b,16(28-29),4211-4214.
MLA Cheng BW,et al."Temperature dependence of photoluminescence of flat and undulated SiGe/Si multiple quantum wells".international journal of modern physics b 16.28-29(2002):4211-4214.
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