Influence of heated catalyzer on thermal distribution of substrate in HWCVD system

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	Influence of heated catalyzer on thermal distribution of substrate in HWCVD system
	Zhang Q ; Zhu M ; Wang L ; Liu E
刊名	thin solid films
	2003
卷号	430 期号:1-2 页码:50-53
关键词	catalyzer hot-wire chemical vapor deposition simulation AMORPHOUS-SILICON DEPOSITION
ISSN号	0040-6090
通讯作者	zhu m,chinese acad sci,dept phys,grad sch,pob 3908,beijing 100039,peoples r china.
中文摘要	based on stefan-boltzman and lambert theorems, the radiation energy distribution on substrate (reds) from catalyzer with parallel filament geometry has been simulated by variation of filament and system layout in hot-wire chemical vapor deposition. the reds uniformity is sensitive to the distance between filament and substrate d(f-s) when d(f-s) less than or equal to 4 cm. as d(f-s) > 4 cm, the reds uniformity is independent of d(f-s) and is mainly determined by filament number and filament separation. two-dimensional calculation shows that the reds uniformity is limited by temperature decay at filament edges. the simulation data are in good agreement with experiments. (c) 2003 elsevier science b.v. all rights reserved.
学科主题	半导体材料
收录类别	SCI
语种	英语
公开日期	2010-08-12
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/11540]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Zhang Q,Zhu M,Wang L,et al. Influence of heated catalyzer on thermal distribution of substrate in HWCVD system[J]. thin solid films,2003,430(1-2):50-53.
APA	Zhang Q,Zhu M,Wang L,&Liu E.(2003).Influence of heated catalyzer on thermal distribution of substrate in HWCVD system.thin solid films,430(1-2),50-53.
MLA	Zhang Q,et al."Influence of heated catalyzer on thermal distribution of substrate in HWCVD system".thin solid films 430.1-2(2003):50-53.