Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films

	Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films
	Yu, Ge ; Liu, Ya ; Hong, Danhong ; Li, Donglin ; Zang, Jianxin
刊名	advanced materials research
	2012
页码	557-559
学科主题	半导体材料
收录类别	EI
语种	英语
公开日期	2013-05-07
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/23975]
专题	半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式 GB/T 7714	Yu, Ge,Liu, Ya,Hong, Danhong,et al. Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films[J]. advanced materials research,2012:557-559.
APA	Yu, Ge,Liu, Ya,Hong, Danhong,Li, Donglin,&Zang, Jianxin.(2012).Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films.advanced materials research,557-559.
MLA	Yu, Ge,et al."Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films".advanced materials research (2012):557-559.