Fabrication of arrayed waveguide grating based on SOI material

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	Fabrication of arrayed waveguide grating based on SOI material
	Fang, Q ; Li, F ; Liu, YL
刊名	journal of infrared and millimeter waves
	2005
卷号	24 期号:2 页码:143-146
关键词	multiplexer/demultiplexer
ISSN号	1001-9014
通讯作者	fang, q, chinese acad sci, inst semicond, beijing 100083, peoples r china.
中文摘要	an arrayed waveguide grating based on soi material was fabricated by inductive coupled plasma (icp) etching technology. the central wavelength of the device was designed at 1.5509 mu m and the channel spacing was 200 ghz. comparing with the values of the design, the differences of the central wavelength and the channel spacing in the test were 0.28 nm and 0.02 nm, respectively. the adjacent channel crosstalk was about 10 db, and the uniformity of the five channels' insertion loss was only 0.7 db. the results show that the device can be used as a demultiplexer.
学科主题	光电子学
收录类别	SCI
语种	中文
公开日期	2010-03-17
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/8782]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Fang, Q,Li, F,Liu, YL. Fabrication of arrayed waveguide grating based on SOI material[J]. journal of infrared and millimeter waves,2005,24(2):143-146.
APA	Fang, Q,Li, F,&Liu, YL.(2005).Fabrication of arrayed waveguide grating based on SOI material.journal of infrared and millimeter waves,24(2),143-146.
MLA	Fang, Q,et al."Fabrication of arrayed waveguide grating based on SOI material".journal of infrared and millimeter waves 24.2(2005):143-146.