Fabrication and Infrared Optical Properties of Nano Vanadium Dioxide Thin Films
Li GK; Liu J
刊名acta physico-chimica sinica
2009
卷号25期号:8页码:1523-1529
关键词Dual ion beam sputtering Nano-vanadium dioxide thin film Transmission
ISSN号1000-6818
通讯作者liang jr tianjin univ sch elect & informat engn tianjin 300072 peoples r china. e-mail address: liang_jiran@tju.edu.cn
中文摘要vanadium dioxide thin films were fabricated by ion beam sputtering on si3n4/sio2/si after a post reductive annealing process in a nitrogen atmosphere. x-ray diffraction (xrd), scanning electron microscope (sem), and x-ray photoelectron spectroscopy (xps) were employed to analyze the effects of post annealing temperature on crystallinity, morphology, and composition of the vanadium oxide thin films. transmission properties of vanadium dioxide thin films were measured by fourier transform-infrared (ft-ir) spectroscopy. the results showed that the as-deposited vanadium oxide thin films were composed of non-crystalline v2o5 and a tetragonal rutile vo2. after annealing at 400 degrees c for 2 h, the mixed phase vanadium oxide (vox) thin film changed its composition and structure to vo2 and had a (011) oriented monoclinic rutile structure. when increasing the temperature to 450 degrees c, nano vo2 thin films with smaller grains were obtained. ft-ir results showed that the transmission contrast factor of the nano vo2 thin film was more than 0.99 and the transmission of smaller grain nano vo2 thin film was near zero at its switched state. nano vo2 thin film with smaller grains is an ideal material for application in optical switching devices.
学科主题半导体化学
收录类别SCI
资助信息national high-tech research and development program of china 2008aa031401 national natural science foundation of china 60771019 tianjin key program of applied foundation and advanced-tech research china 08jczdjc17500 the project was supported by the national high-tech research and development program of china (863) (2008aa031401) national natural science foundation of china (60771019) and tianjin key program of applied foundation and advanced-tech research china (08jczdjc17500).
语种中文
公开日期2010-03-08
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/7063]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Li GK,Liu J. Fabrication and Infrared Optical Properties of Nano Vanadium Dioxide Thin Films[J]. acta physico-chimica sinica,2009,25(8):1523-1529.
APA Li GK,&Liu J.(2009).Fabrication and Infrared Optical Properties of Nano Vanadium Dioxide Thin Films.acta physico-chimica sinica,25(8),1523-1529.
MLA Li GK,et al."Fabrication and Infrared Optical Properties of Nano Vanadium Dioxide Thin Films".acta physico-chimica sinica 25.8(2009):1523-1529.
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