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	Stress induced anisotropic diffusion during plasma-assisted nitriding of a Ni-based alloy
	He, H; Zou, JX; Dong, C; Czerwiec, T; Michel, H
刊名	5th Pacific Rim International Conference on Advanced Materials and Processing
	2005
卷号	475-479页码:3669-3672
关键词	plasma-assisted nitriding anisotropic diffusion Ni-based alloy grain orientation
ISSN号	0255-5476
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/6164156
专题	大连理工大学
作者单位	1.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China. 2.Ecole Mines, CNRS, UMR 7570, Lab Sci & Genie Surfaces, F-54042 Nancy, France.
推荐引用方式 GB/T 7714	He, H,Zou, JX,Dong, C,et al. Stress induced anisotropic diffusion during plasma-assisted nitriding of a Ni-based alloy[J]. 5th Pacific Rim International Conference on Advanced Materials and Processing,2005,475-479:3669-3672.
APA	He, H,Zou, JX,Dong, C,Czerwiec, T,&Michel, H.(2005).Stress induced anisotropic diffusion during plasma-assisted nitriding of a Ni-based alloy.5th Pacific Rim International Conference on Advanced Materials and Processing,475-479,3669-3672.
MLA	He, H,et al."Stress induced anisotropic diffusion during plasma-assisted nitriding of a Ni-based alloy".5th Pacific Rim International Conference on Advanced Materials and Processing 475-479(2005):3669-3672.

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