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	Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification
	Zhang, Zhiqiang; Duan, Huigao; Wu, Yihui; Zhou, Wuping; Liu, Cong; Tang, Yuguo; Li, Haiwen
刊名	Microelectronic Engineering
	2014
卷号	Vol.128页码:59-65
关键词	Electron-beam lithography Hydrogen silsesquioxane (HSQ) Adhesion Chemical modification
ISSN号	0167-9317
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/6102952
专题	湖南大学
作者单位	1.CAS Key Lab of Bio-Medical Diagnostics, Suzhou Institute of Biomedical Engineering and Technology, Chinese Academy of Sciences, Suzhou 215163, China 2.College of Physics and Microelectronics, Hunan University, Changsha, Hunan 410082, China 3.State
推荐引用方式 GB/T 7714	Zhang, Zhiqiang,Duan, Huigao,Wu, Yihui,et al. Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification[J]. Microelectronic Engineering,2014,Vol.128:59-65.
APA	Zhang, Zhiqiang.,Duan, Huigao.,Wu, Yihui.,Zhou, Wuping.,Liu, Cong.,...&Li, Haiwen.(2014).Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification.Microelectronic Engineering,Vol.128,59-65.
MLA	Zhang, Zhiqiang,et al."Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification".Microelectronic Engineering Vol.128(2014):59-65.

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